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中国物理学会期刊
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Yu Xiao-Zhu, Wang Ting-Ting, Ye Chao, Ning Zhao-Yuan. Effect of CH4-doping on configuration and dielectric properties of SiCOH low-k filmsJ. Acta Physica Sinica, 2005, 54(11): 5417-5421. DOI: 10.7498/aps.54.5417
Citation: Yu Xiao-Zhu, Wang Ting-Ting, Ye Chao, Ning Zhao-Yuan. Effect of CH4-doping on configuration and dielectric properties of SiCOH low-k filmsJ. Acta Physica Sinica, 2005, 54(11): 5417-5421. DOI: 10.7498/aps.54.5417
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Effect of CH4-doping on configuration and dielectric properties of SiCOH low-k films

Acta Phys. Sin., 2005, 54(11): 5417-5421.
DOI: 10.7498/aps.54.5417
CSTR: 32037.14.aps.54.5417
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