Effects of charging at dielectric surfaces on the characteristics of the sheath for plasma immersion ion implantation

Li Xue-Chun; Wang You-Nian

doi:10.7498/aps.53.2666

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Li Xue-Chun, Wang You-Nian. Effects of charging at dielectric surfaces on the characteristics of the sheath for plasma immersion ion implantationJ. Acta Physica Sinica, 2004, 53(8): 2666-2669. DOI: 10.7498/aps.53.2666

Citation:

Li Xue-Chun, Wang You-Nian. Effects of charging at dielectric surfaces on the characteristics of the sheath for plasma immersion ion implantationJ. Acta Physica Sinica, 2004, 53(8): 2666-2669. DOI: 10.7498/aps.53.2666

Citation:

Li Xue-Chun, Wang You-Nian. Effects of charging at dielectric surfaces on the characteristics of the sheath for plasma immersion ion implantationJ. Acta Physica Sinica, 2004, 53(8): 2666-2669. DOI: 10.7498/aps.53.2666