STUDY ON PLASMA ETCHING OF β-SiC THIN FILMS IN SF6 AND THE SF6+O2 MIXTURES

CHAI CHANG-CHUN; YANG YIN-TANG; LI YUE-JIN; JIA HU-JUN; JI HUI-LIAN

doi:10.7498/aps.48.550

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CHAI CHANG-CHUN, YANG YIN-TANG, LI YUE-JIN, JIA HU-JUN, JI HUI-LIAN. STUDY ON PLASMA ETCHING OF β-SiC THIN FILMS IN SF6 AND THE SF6+O2 MIXTURESJ. Acta Physica Sinica, 1999, 48(3): 550-555. DOI: 10.7498/aps.48.550

Citation:

CHAI CHANG-CHUN, YANG YIN-TANG, LI YUE-JIN, JIA HU-JUN, JI HUI-LIAN. STUDY ON PLASMA ETCHING OF β-SiC THIN FILMS IN SF6 AND THE SF6+O2 MIXTURESJ. Acta Physica Sinica, 1999, 48(3): 550-555. DOI: 10.7498/aps.48.550

Citation:

CHAI CHANG-CHUN, YANG YIN-TANG, LI YUE-JIN, JIA HU-JUN, JI HUI-LIAN. STUDY ON PLASMA ETCHING OF β-SiC THIN FILMS IN SF6 AND THE SF6+O2 MIXTURESJ. Acta Physica Sinica, 1999, 48(3): 550-555. DOI: 10.7498/aps.48.550