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中国物理学会期刊
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JI HANG, ZHAO TE-XIU, WANG XIAO-PING, DONG YI. AN IN-SITU STUDY OF ELECTRICAL RESISTIVITY OF MAGNETRON SPUTTERING Mo FILMJ. Acta Physica Sinica, 1993, 42(8): 1340-1345. DOI: 10.7498/aps.42.1340
Citation: JI HANG, ZHAO TE-XIU, WANG XIAO-PING, DONG YI. AN IN-SITU STUDY OF ELECTRICAL RESISTIVITY OF MAGNETRON SPUTTERING Mo FILMJ. Acta Physica Sinica, 1993, 42(8): 1340-1345. DOI: 10.7498/aps.42.1340
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AN IN-SITU STUDY OF ELECTRICAL RESISTIVITY OF MAGNETRON SPUTTERING Mo FILM

Acta Phys. Sin., 1993, 42(8): 1340-1345.
DOI: 10.7498/aps.42.1340
CSTR: 32037.14.aps.42.1340
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