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中国物理学会期刊

调制掺杂GaAs/N-AlGaAs异质结的制备及输运性质

CSTR: 32037.14.aps.35.269

GROWTH AND TRANSPORT PROPERTIER OF MODULATION DOPED GaAs/AlGaAs HETEROSTRUCTURES

CSTR: 32037.14.aps.35.269
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  • 本文报道利用垂直束源式的分子束外延设备,生长了高质量的调制掺杂GaAs/N-AIGaAs异质结构,液氦温度下的二维电子迁移率达4.26×105cm2/V·s(非光照)、5.9×105cm2/V·S(光照)。用脉冲磁场下的磁声子共振测量,得到了二维电子的有效质量,并研究了异质结构中二维电子的低场迁移率增强特性及低温强磁场下的量子霍耳效应。

     

    The high quality modulation doped GaAs/N-AlGaAs heterostructures have been grown by a vertical molecular beam epitaxy system (MBE). Electron mobility of two dimentional electron gas (2DBG) at 4.2 K has reached as high as 4.26×105cm2/V·s (in the dark) and 5.9×105cm2/V·s (under light illumination). The polaron mass of 2DEG was determined by analysis of oscillatory resistance change of magnetophonon resonance in pulsed magnetic field. The mobility enhancement of 2DEG in low field and quantum Hall effect in high field at 4.2 K were also studied.

     

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