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针对多层介质膜光栅在光束谱合成系统中的应用, 利用光线追迹方法, 建立了基于多层介质膜光栅的谱合成系统光传输模型. 多层介质膜光栅引入的相位调制包括浮雕表面上光程差与浮雕结构光程差两部分, 且受到光栅槽深、占空比和光束入射角等因素的影响. 利用衍射积分方法和光束非相干叠加原理, 计算模拟了基于多层介质膜光栅的谱合成系统的合成光束光强分布. 在此基础上, 利用强度二阶矩方法分析了合成光束的光束质量, 并讨论了多层介质膜光栅的槽深、占空比和制作误差等因素对合成光束特性的影响. 结果表明: 改变多层介质膜光栅的槽深和占空比以及中心光束入射角会影响合成光束能量, 但不会影响合成光束的光束质量, 合成光束的光束质量始终保持与单个子光束的光束质量相当; 多层介质膜光栅的制作误差对合成光束的光束质量和能量均存在明显影响.Aiming at the application of multilayer dielectric gratings (MDGs) in spectral beam combining (SBC) systems, a theoretical model of rectangular MDGs is built up and a beam propagation model of SBC systems based on the rectangular MDGs is further developed. The phase modulation introduced by the rectangular MDG is composed of the optical path difference on the top surface of reliefs and that of the relief structure itself, and is affected by the MDG parameters such as the grating groove depth, the grating duty cycle, the incidence angle of the central beam, etc. By the diffraction integral method and the principle of incoherent superposition, the intensity distribution of the combined beam of the SBC system based on the rectangular MDGs is numerically calculated and analyzed. Additionally, the beam quality of the combined beam is also obtained by the intensity second-order moments method, and the effects of the MDG parameters such as the groove depth, the duty cycle, the incidence angle of the central beam, and the fabrication errors of the MDG on the characteristics of the combined beam of the SBC systems are simulated and discussed in detail. The simulation results show that the beam quality of the combined beam after passing through the SBC systems is significantly better than that of the laser array. Since the quality of the combined beam is almost the same as that of an individual laser beam, for a SBC system without fabrication error, changing the groove depth, the duty cycle of the rectangular MDG or the incidence angle of the central beam does not affect the beam quality while it has obvious influence on the energy of the combined beam. This is mainly because the diffraction efficiency of the rectangular MDG depends on both the parameters of the MDG and the incidence angle of the central beam. However, fabrication error of MDG is unavoidable, and the fabrication error has a significant effect on both the beam quality and the energy of the combined beam. Compared with the effect generated by the groove depth error on beam quality, the influence introduced by the duty cycle error is more obvious. It is worth mentioning that the theoretical model of the SBC system based on the rectangular MDG can be applied to some other high-power laser systems due to its advantages such as low absorption and high damage threshold.
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Keywords:
- spectral beam combining /
- multilayer dielectric grating /
- laser array /
- beam quality
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[2] Lu C A, Newell T C, Glebov L, Balakrishnan G 2015 Electron. Lett. 51 508
[3] Bousselet P, Simonneau C, Bayart D, Salet P, Lucas-Leclin G, Roger G, Georges P, Auzanneau S, Michel N, Calligaro M, Parillaud O, Lecomte M, Krakowski M 2005 Optical Fiber Communication Conference Anaheim, California United States, 6 March, 2005 OThL2
[4] Zhan S B, Zhao S H, Chu X C, Wu Z L, Shi L 2010 Opt. Laser. Technol. 42 308
[5] Sheng B J, Tan J C, Zheng G W, He Y L 2011 High Power Laser and Particle Beams 23 593 (in Chinese) [沈本剑, 谭吉春, 郑光威, 何焰蓝 2011 强激光与粒子束 23 593]
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[7] Pan L L, Zhang B, Yin S Q, Zhang Y 2009 Acta Phys. Sin. 58 8289 (in Chinese) [潘雷雷, 张彬, 阴素琴, 张艳 2009 58 8289]
[8] Boyd R D, Britten J A, Decker D E, Shore B W, Stuart B C, Perry M D, Li L F 1995 Appl. Opt. 34 1697
[9] Kemme S A, Scrymgeour D A, Peters D W 2012 SPIE, Laser Technology for Defense and Security Baltimore, Maryland, April 23, 2012 p83810Q
[10] Meng H C, Wu D Y, Tan H, Li J M, Yu J H, Gao S X 2015 Chinese J. Lasers 42 0302003 (in Chinese) [孟慧成, 武德勇, 谭昊, 李建民, 余俊宏, 高松信 2015 中国激光 42 0302003]
[11] Neauport J, Lavastre E, Raz G, Dupuy G, Bonod N, Balas M, Villele G, Flamand J, Kaladgew S, Desserouer F 2007 Opt. Express 15 12508
[12] Wang J P, Jin Y X, Shao J D, Fan Z X 2010 Opt. Lett. 35 187
[13] Guan H Y, Jin Y X, Liu S J, Kong F Y, Du Y, He K, Yi K, Shao J D 2014 Appl. Phys. B 114 557
[14] Daneu V, Sanchez A, Fan T Y, Choi H K, Turner G W, Cook C C 2000 Opt. Lett. 25 405
[15] Bochove E J 2001 Proc. SPIE 4270 95
[16] Schnopper H W, Van Speybroeck L P, Delvaille J P, Epstein A, Kllne E, Bachrach R Z, Dijkstra J, Lantward L 1977 Appl. Opt. 16 1088
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[1] Drachenberg D R, Andrusyak O, Venus G, Smirnow V, Glebov L B 2014 Appl. Opt. 53 1242
[2] Lu C A, Newell T C, Glebov L, Balakrishnan G 2015 Electron. Lett. 51 508
[3] Bousselet P, Simonneau C, Bayart D, Salet P, Lucas-Leclin G, Roger G, Georges P, Auzanneau S, Michel N, Calligaro M, Parillaud O, Lecomte M, Krakowski M 2005 Optical Fiber Communication Conference Anaheim, California United States, 6 March, 2005 OThL2
[4] Zhan S B, Zhao S H, Chu X C, Wu Z L, Shi L 2010 Opt. Laser. Technol. 42 308
[5] Sheng B J, Tan J C, Zheng G W, He Y L 2011 High Power Laser and Particle Beams 23 593 (in Chinese) [沈本剑, 谭吉春, 郑光威, 何焰蓝 2011 强激光与粒子束 23 593]
[6] Zhang Y, Zhang B, Zhu S J 2007 Acta Phys. Sin. 56 4590 (in Chinese) [张艳, 张彬, 祝颂军 2007 56 4590]
[7] Pan L L, Zhang B, Yin S Q, Zhang Y 2009 Acta Phys. Sin. 58 8289 (in Chinese) [潘雷雷, 张彬, 阴素琴, 张艳 2009 58 8289]
[8] Boyd R D, Britten J A, Decker D E, Shore B W, Stuart B C, Perry M D, Li L F 1995 Appl. Opt. 34 1697
[9] Kemme S A, Scrymgeour D A, Peters D W 2012 SPIE, Laser Technology for Defense and Security Baltimore, Maryland, April 23, 2012 p83810Q
[10] Meng H C, Wu D Y, Tan H, Li J M, Yu J H, Gao S X 2015 Chinese J. Lasers 42 0302003 (in Chinese) [孟慧成, 武德勇, 谭昊, 李建民, 余俊宏, 高松信 2015 中国激光 42 0302003]
[11] Neauport J, Lavastre E, Raz G, Dupuy G, Bonod N, Balas M, Villele G, Flamand J, Kaladgew S, Desserouer F 2007 Opt. Express 15 12508
[12] Wang J P, Jin Y X, Shao J D, Fan Z X 2010 Opt. Lett. 35 187
[13] Guan H Y, Jin Y X, Liu S J, Kong F Y, Du Y, He K, Yi K, Shao J D 2014 Appl. Phys. B 114 557
[14] Daneu V, Sanchez A, Fan T Y, Choi H K, Turner G W, Cook C C 2000 Opt. Lett. 25 405
[15] Bochove E J 2001 Proc. SPIE 4270 95
[16] Schnopper H W, Van Speybroeck L P, Delvaille J P, Epstein A, Kllne E, Bachrach R Z, Dijkstra J, Lantward L 1977 Appl. Opt. 16 1088
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