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中国物理学会期刊

界面工程调控GaN基异质结界面热传导性能研究

Interface engineering moderated interfacial thermal conductance of GaN-based heterointerfaces

CSTR: 32037.14.aps.72.20230791
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  • GaN以其宽禁带、高电子迁移率、高击穿场强等特点在高频大功率电子器件领域有着巨大的应用前景. 大功率GaN电子器件在工作时存在明显的自热效应, 产生大量焦耳热, 散热问题已成为制约其发展的瓶颈. 而GaN与衬底间的界面热导是影响GaN电子器件热管理全链条上的关键环节. 本文首先讨论各种GaN界面缺陷及其对界面热导的影响; 然后介绍常见的界面热导研究方法, 包括理论分析和实验测量; 接着结合具体案例介绍近些年发展的GaN界面热导优化方法, 包括常见的化学键结合界面类型及范德瓦耳斯键结合的弱耦合界面; 最后总结全文, 为GaN器件结构设计提供有价值参考.

     

    Gallium nitride (GaN) has great potential applications in the field of high-frequency and high-power electronic devices because of its excellent material properties such as wide band gap, high electron mobility, high breakdown field strength. However, the high power GaN electronic device also exhibits significant self-heating effects in operation, such as a large amount of Joule heat localized in the thermal channel, and heat dissipation has become a bottleneck in its applications. The interface thermal conductance (ITC) between GaN and its substrate is the key to determining the thermal dissipation. In this work the various GaN interface defects and their effects on ITC are first discussed, and then some methods of studying interface thermal transport are introduced, including theoretical analysis and experimental measurements. Then, some GaN ITC optimization strategies developed in recent years are introduced through comparing the specific cases. In addition to the common chemical bond interface, the weak coupling interface by van der Waals bond is also discussed. Finally, a summary for this review is presented. We hope that this review can provide valuable reference for actually designing GaN devices.

     

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