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中国物理学会期刊

第三代半导体材料及器件中的热科学和工程问题

Thermal science and engineering in third-generation semiconductor materials and devices

CSTR: 32037.14.aps.70.20211662
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  • 简单回顾了半导体材料的发展历史, 并以基于氮化镓的高电子迁移率晶体管为例, 介绍了第三代半导体器件的产热机制和热管理策略. 以β相氧化镓为例, 简单讨论了新兴的超宽禁带半导体的发展和热管理挑战. 然后重点讨论了一些界面键合技术用于半导体散热的进展, 同时指出这些器件中大量存在的界面散热的工程难题背后的科学问题: 界面传热的物理理解. 在回顾了之前界面传热的理论发展后, 指出了理解界面传热当前遇到的一些困难、机遇和方向.

     

    The history of semiconductor materials is briefly reviewed in this work. By taking GaN-based high electron mobility transistor as an example, the heat generation mechanisms and thermal management strategies of wide bandgap semiconductor devices are discussed. Moreover, by taking β-Ga2O3 as an example, the thermal management challenges of emerging ultrawide bandgap semiconductors are briefly discussed. The following discussions focus on the interfacial thermal transport which widely exists in the semiconductor devices mentioned above. The recent advancements in room-temperature wafer bonding for thermal management applications are summarized. Furthermore, some open questions about the physical understanding of interfacial thermal transport are also mentioned. Finally, the theoretical models for calculating thermal boundary conductance are reviewed and the challenges and opportunities are pointed out.

     

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