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磷化铟(InP)具备电子迁移率高、禁带宽度大、耐高温、耐辐射等特性, 是制备空间辐射环境下电子器件的重要材料. 随着电子器件小型化, 单个重离子在器件灵敏体积内产生的位移损伤效应可能会导致其永久失效. 因此, 本文使用蒙特卡罗软件Geant4模拟空间重离子(碳、氮、氧、铁)在InP材料中的输运过程, 计算重离子的非电离能量损失(non-ionizing energy loss, NIEL), 得到重离子入射InP材料的位移损伤规律, 主要结论有: 1) NIEL值与原子序数的平方成正比, 重离子原子序数越大, 在InP材料中产生位移损伤的能力越强; 2)重离子NIEL比次级粒子NIEL大3—4个量级, 而NIEL与核弹性碰撞产生的反冲原子的非电离损伤能成正比, 说明重离子在材料中撞出的初级反冲原子是导致InP材料中产生位移损伤的主要原因; 3)空间辐射环境中重离子数目占比少, 一年中重离子在0.0125 mm3 InP中产生的总非电离损伤能占比为2.52%, 但重离子NIEL值是质子和α粒子的2—30倍, 仍需考虑单个空间重离子入射InP电子器件产生的位移损伤效应. 4)低能重离子在较厚材料中完全沉积导致平均非电离损伤能分布不均匀(前高后低), 使NIEL值随材料厚度的增大而略微减小, 重离子位移损伤严重区域分布在材料前端. 研究结果为InP材料在空间辐射环境中的应用打下基础.Indium phosphide (InP) has the characteristics of high electron mobility, large band gap, high temperature resistance, and radiation resistance. It is an important material of electronic devices in the space radiation environment. With the miniaturization of electronic devices, the displacement damage (DD) effect caused by a single heavy ion in the device may give rise to permanent failure. Therefore, this paper uses Monte Carlo software Geant4 to simulate the transportation process of space heavy ions(C, N, O, Fe) in InP. The non-ionizing energy loss (NIEL) of heavy ions is calculated for getting the information about displacement damage. Some conclusions are drawn as follows. 1) NIEL is proportional to the square of the atomic number, which means that single Fe can make severe displacement damage in InP. 2) The heavy ions NIEL is 3 to 4 orders of magnitude larger than PKA NIEL. The NIEL is proportional to the non-ionizing damage energy of recoil atoms produced by nuclear elastic collision, which indicates that the primary recoil atoms produced by heavy ions are the main cause of InP DD. 3) The number of heavy ions in space is small, so the proportion of total non-ionizing damage energy produced by heavy ions in 0.0125 mm3 InP is only 2.56% in one year. But the NIEL of heavy ions NIEL is 2–30 times that of protons and α particles, so the DD effect caused by single heavy ion incident on InP electronic device still needs to be considered. 4) NIEL decreases slightly with the increase of material thickness. The reason is that low-energy heavy ions are completely deposited in the front of InP, resulting in a non-uniform distribution of non-ionizing energy deposited in the material. Analyzing the dependence of mean DD energy with depth, we find that mean DD energy decreases with incident depth increasing, which means that the most severe DD region of heavy ions in InP is in the front of material.
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Keywords:
- indium phosphide /
- displacement damage /
- Geant4 /
- non-ionizing energy loss








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