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中国物理学会期刊

超薄介质插层调制的氧化铟锡/锗肖特基光电探测器

Indium tin oxid/germanium Schottky photodetectors modulated by ultra-thin dielectric intercalation

CSTR: 32037.14.aps.70.20210138
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  • 本文通过在氧化铟锡(indium tin oxide, ITO)透明电极和锗(germanium, Ge)之间引入超薄氧化物介质层以调节其接触势垒高度, 制备出低暗电流、高响应度的锗肖特基光电探测器. 比较研究了采用不同种类介质Al2O3和MoO3, 以及不同掺杂浓度的锗和硅衬底上外延锗材料制作的ITO/Ge肖特基二极管特性. 发现2 nm厚的Al2O3插层可有效提高ITO与n-Ge和i-Ge的接触势垒高度, 而MoO3插层对ITO与不同Ge材料的接触势垒高度影响不明显. ITO/Al2O3/i-Ge探测器由于其增大的势垒高度表现出性能最佳, 暗电流(–4 V)密度低至5.91 mA/cm2, 1310 nm波长处光响应度高达4.11 A/W. 而基于硅基外延锗(500 nm)材料制作的ITO/Al2O3/Ge-epi光电探测器的暗电流(–4 V)密度为226.70 mA/cm2, 1310 nm处光响应度为0.38 A/W. 最后, 使用二维位移平台对ITO/Al2O3/i-Ge光电探测器进行了单点成像实验, 在1310 nm, 1550 nm两个波段得到了清晰可辨的二维成像图.

     

    Germanium (Ge) photodetectorhas been considered as one of the promising optoelectronic devices for optoelectronic integration. So far, most of reported Ge photodetectors with bulk Ge show high dark currents and low responsivities. In this paper, ultra-thin dielectric interlayer-modulated indium tin oxid (ITO)/Ge Schottky photodetectors with high responsivities and low dark currents are investigated, in which the ultra-thin dielectric interlayers are deposited through atomic layer deposition. The characteristics of ITO/Al2O3 (or MoO3)/Ge Schottky photodiodes fabricated on bulk Ge wafers with various doping concentrations and Ge epilayer on silicon substrates are comparatively studied. It is found that the 2-nm-thick Al2O3 intercalation between ITO transparent electrode and Ge can effectively enhance the Schottky barrier heights of the photodetectors and trap holes at interface states, rendering their dark currents low and responsivities high. The effective Schottky barrier heights increase from 0.34 eV (ITO/i-Ge) to 0.55 eV (ITO/Al2O3/i-Ge), and from 0.24 eV (ITO/n-Ge) to 0.56 eV (ITO/Al2O3/n-Ge). While MoO3 intercalation between ITO and Ge has no significant effect on the characteristics of all of the photodetectors due to its large electron affinity. The best performance is realized on the ITO/Al2O3/i-Ge photodetector with a low dark current of 5.91 mA/cm–2 at –4 V, sharply dropping by two orders of magnitude, compared with that of the ITO/i-Ge photodetector without the Al2O3 interlayer, and the responsivity is significantly improved to 4.11 A/W at 1310 nm. The ITO/Al2O3/epi-Ge photodetector fabricated on 500 nm Ge epilayer on a silicon substrate also shows the improved performance with a dark current density of 226.70 mA/cm2 at –3 V and a responsivity of 0.38 A/W at 1310 nm, compared with ITO/epi-Ge photodetector. Finally, experiment studies of single-point infrared images at 1310 nm and 1550 nm are carried out with the ITO/Al2O3/i-Ge photodetector on a two-dimensional XY displacement platform, which contains 25 pixels and a total detection size of 1750 μm × 1750 μm. The clear and distinguishable images of the infrared spot position are obtained. Consequently, these results suggest that the dielectric interlayer- modulated Schottky photodetectors are competitive in low power consumption and high responsivity, and have great potential applications in the civil field of short wave infrared imaging.

     

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