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1950年黄昆先生与A. Rhys(里斯, 黄昆先生夫人, 中文名李爱扶)发表了F-中心的光吸收与非辐射跃迁理论的论文, 这一论文被公认为是处理电子-声子互作用在固体缺陷光吸收的先驱开创性量子理论工作, 其中首先由黄昆先生所推导和明确的一个用于表征电子-声子耦合强度的无量纲因子, 被广泛采用和推崇为黄-里斯因子(Huang-Rhys factor), 也被简称为S因子. 本文试图总结黄-里斯因子的物理内涵, 以及它在阐释几种固体有关光学性质中的关键作用, 包括在深缺陷中心发光以及带边浅杂质束缚激子发光中的支配作用. 研究发现, 在不同性质的固体材料中, 电子(激子)-声子耦合强度可以分为极弱耦合(黄-里斯因子远远小于1)、中等耦合(黄-里斯因子在1—5之间)以及强耦合(黄-里斯因子远远大于1)等几种情况. 限于篇幅及个人理解, 本文仅讨论GaN各种带边激子、二维单原子层半导体激子、无机卤族钙钛矿纳米晶片激子以及金刚石单晶中NV复合中心等极弱及中等强度耦合等几种情况, 以纪念黄昆先生诞辰百周年.Huang and Rhys published a quantum theoretical treatment to the light absorption in F-centre in solids, which has been widely recognized as the first detailed quantum-mechanical calculation. In the Huang-Rhys’s seminal theoretical treatment, they derived a dimensionless factor to characterize electron-phonon coupling strength which was named later as Huang-Rhys factor. Since then, Huang-Rhys factor has been generally accepted. In this short review, the physical nature of Huang-Rhys factor and several application examples in solids are introduced and presented in memory of the hundredth anniversary of Prof. Kun Huang. Due to limited publication space and my personal understanding on Huang-Rhys factor, only several cases including GaN, 2D WS2 monolayer semiconductor, inorganic CsPbBr3 perovskite nanosheets and NV centers in diamond, in which the extremely-weak and medium strong coupling between electron (exciton) and phonon occur, are discussed in this short review.
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Keywords:
- phonon-electron interactions /
- Huang-Rhys factor /
- optical properties of solids /
- luminescence








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