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中国物理学会期刊

应变加载下Si纳米线电输运性能的原位电子显微学研究

CSTR: 32037.14.aps.63.117303

Study on electrical transport properties of strained Si nanowires by in situ transmission electron microscope

CSTR: 32037.14.aps.63.117303
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  • 半导体纳米材料超大的弹性极限使其物理性能具有很宽的调谐范围,被认为是应变工程理想的研究材料,引起了人们广泛的关注. 本研究中,利用聚焦离子束技术从p型Si的单晶薄膜上切割出取向的单根纳米线,在透射电子显微镜中利用纳米操控系统对其加载弯曲形变,同时实时监测其电流-电压曲线的变化,研究弯曲应变对其电学性能的影响. 结果表明,随着应变的增大,纳米线输运性能明显增强,当应变接近2%时,输运性能随应变的提升接近饱和;当应变达到3%以后,输运性能有时会略微下降,这可能由塑形事件导致的. 本实验结果可能会对Si应变工程起到重要的参考意义.

     

    Strain engineering in semiconductor nanostructure has been received great attention because their ultra-large elastic limit can induce a broad tuning range of the physical properties. Here, we report how the electrical transport properties of the p-type -oriented Si nanowires may be tuned by bending strain and affected by the plastic deformation in a transmission electron microscope. These freestanding nanowires were prepared from commercial silicon-on-insulator materials using the focusing ion beam technique. Results show that the conductivity of these Si nanowires is improved remarkably by bending strain when the strain is lower than 2%, while the improvement is nearly saturated when the strain approaches to 2%. The electric current will reduce a little sometimes when strain exceeds 3%, which may result from plastic events. Our experimental results may be helpful to Si strain engineering.

     

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