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中国物理学会期刊

基于I-V-T和C-V-T的GaN上Ni/Au肖特基接触特性研究

CSTR: 32037.14.aps.56.3483

Characterization of Ni/Au GaN Schottky contact base on I-V-T and C-V-T measurements

CSTR: 32037.14.aps.56.3483
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  • 基于对制作在n-GaN上的肖特基二极管的变温I-V测试和C-V测试,采用表面势垒减薄模型对肖特基二极管的电流输运特性进行了研究.试验结果表明,肖特基接触的电流输运机理非常复杂,在不同的温度条件和偏压条件下有着不同的电流输运机理.在此基础上对肖特基接触I-V特性方程进行了修正,得到了很好的拟合曲线.试验表明,高温I-V法提取的势垒高度与常温C-V法提取的势垒高度接近于根据金属功函数得出的理论势垒高度值.

     

    Based on the temperature-dependent current-voltage (I-V-T) measurements and the temperature-dependent capacitance-voltage (C-V-T) measurements of Schottky diodes fabricated on n-type GaN,the mechanism of the electrical current transport was discussed using thin surface barrier (TSB) model. The experiment results indicated that there are different mechanisms at different temperatures and bias. Based on this assumption we give a modified I-V characteristic formula which gives excellent fit to the experiment data. The SBHs determined from high-temperature I-V curves,low-temperature C-V curves,and the metal work function agree well each other.

     

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