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中国物理学会期刊

由缺陷引起的Burstein-Moss和带隙收缩效应对CdIn2O4透明导电薄膜光带隙的影响

CSTR: 32037.14.aps.54.842

Effect on optical band-gap of transparent and conductive CdIn2O4 thin film due to defects-induced burstein-moss and band-gap narrowing characteristics

CSTR: 32037.14.aps.54.842
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  • 在Ar+O2气氛,采用射频反应溅射CdIn靶制备CdIn2O4(CIO)薄膜.通过对不同衬底 温度下制备和沉积后在氩气流中退火的薄膜进行透射、反射和Hall效应的测量和分析发现, 随着衬底温度的降低,载流子浓度呈上升趋势,而吸收边呈现先是“蓝移”然后“红移”的 现象.从理论上阐述了高浓度的点缺陷对CIO氧化物薄膜的能带产生的重要影响,这些影响主 要体现在带尾的形成,BursteinMoss(BM)漂移和带隙收缩.另外,衬底温度的变化将对 薄膜的迁移率有重要影响.对于CIO薄膜,由缺陷产生的空穴浓度将对薄膜的带隙收缩产生重 要影响并将直接影响到薄膜的光透性.由于存在吸收带尾,利用传统的“外推法”获得薄膜 的光带隙并不适合简并半导体,而应使用更为准确的“拟合法”.

     

    Transparent and conductive oxides CdIn2O4 (CIO) thin films were prepared by RF reactive sputtering from a CdIn alloy target in Ar+O2 atmosphere. By the analysis and measurements of transmittance spectra and Hall_effect of different samples prepared at different substrate temperatures and post_deposition annealing in an Ar gas flow, it was found that the carrier density increases with the d ecrease of substrate temperature, but the absorption edge shows an abrupt change from a blue_shift to a red_shift. Theoretically, the paper formulated the effec t on band structure due to higher density of point defects, it embodies the band _tailing, Burstein_Moss (B_M) shift and band_gap narrowing. In addition,density of ionized impurity substrate temperature induced will affect the carrier mobili ty.The hole density impurity_induced will influences the magnitude of optical ba nd_gap and transmittance of light. Since extrapolation method does not fit degen erate materials, a more accurate method of obtaining band_gap is the method of c urve fitting.

     

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