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中国物理学会期刊

AlN在AlN/VN纳米多层膜中的相转变及其对薄膜力学性能的影响

CSTR: 32037.14.aps.52.2259

Phase transformation of AlN in AlN/VN nanomultilayers and its effect on the mech anical properties of films

CSTR: 32037.14.aps.52.2259
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  • 采用反应磁控溅射制备了AlN/VN纳米多层膜.研究了多层膜调制周期对AlN生长结构的影响以 及纳米多层膜的力学性能.结果表明:小周期多层膜中的AlN以亚稳的立方相(c-AlN)存在并 与VN形成共格外延生长的超晶格.薄膜产生硬度和弹性模量升高的超硬效应.大调制周期下, AlN从立方结构转变为稳定的六方相(h-AlN),并使多层膜形成纳米晶的“砖墙”型结构. 讨论认为VN的模板作用有利于c-AlN的生长,但不能显著提高其临界厚度.

     

    AlN/VN nanomultilayers were prepared by reactive magnetron sputtering method. Th e effect of modulation period on the microstructure and mechanical properties of AlN/VN nanomultilayers were studied in this work. The results show that AlN exi sts in metastable cubic structure (c-AlN) at small modulation period and forms c oherent epitaxial grown superlattice with VN. At larger modulation periods, AlN transforms from cubic structure to stable hexagonal structure (h-AlN),and the na nomultilayers form a “brick-wall” structure with nanometer grains. The discuss ion shows that the template effect of VN is beneficial to the growth of c-AlN, b ut cannot increase its critical thickness remarkably.

     

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