搜索

x
中国物理学会期刊

浮栅ROM器件辐射效应机理分析

CSTR: 32037.14.aps.52.2235

Mechanism of radiation effects in floating gate ROMs

CSTR: 32037.14.aps.52.2235
PDF
导出引用
  • 分析了浮栅ROM器件的辐射效应机理,合理地解释了实验中观察到的现象.指出辐射产生的电子空穴对在器件中形成的氧化物陷阱电荷和界面陷阱电荷是导致存储单元及其外围电路出现错误的原因.浮栅ROM器件的中子、质子和60Co γ辐射效应都是总剂量效应 .

     

    Mechanism of irradiation effects is analyzed for floating gate read only memorie s (ROMs). Phenomena in experiments are reasonably explained. It is proposed that failures in devices result from oxide trapped charge and interface trapped char ge generated by radiation in memory cells and peripheral circuitry. The neutron, proton and 60Co γ irradiation effects in FLASH ROM and EEPROM a re total dose effects.

     

    目录

    /

    返回文章
    返回
    Baidu
    map