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中国物理学会期刊

Ni0.8Co0.2-SiO2颗粒膜中的Hall效应

CSTR: 32037.14.aps.48.47

The Hall Effect in Ni0.8Co0.2-SiO2 Granular Film

CSTR: 32037.14.aps.48.47
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  • 对用离子束溅射制备的Ni0.8Co0.2-SiO2颗粒膜的Hall效应进行了研究.当Ni0.8Co0.2合金的含量为43vol%时,在9.5×105A/m的外磁场下,样品的室温Hall电阻率达6.3μΩ·cm ,高于普通磁性金属两个数量级以上,还研究了不同NiCo组分样品的电阻率与温度的关系(95—300K),发现x<xc(逾渗组分)时,电阻率与-logT成正比,电阻温度系数为负;当x<xc时,逐渐呈现金属性;而当x≈xc时,为过渡态.还用透射电子显微镜和振动样品磁强计等手段对样品的微结构和磁性进行了对比研究,表明金属-绝缘体颗粒膜中在逾渗阈值附近有较大的Hall效应,这与样品的微结构有密切关系.

     

    The Hall effect in Ni0.8Co0.2-SiO2 granular films which were fabricated by ion beam sputtering technique was studied. The saturated Hall resistivity reached 6.3μΩ·cm in an applied field of 9.5×105 A/m at room temperature when NiCo volume fraction x is near the metal-insulator transition threshold. The temperature dependence of resistivity in these samples with different NiCo compositions was also investigated. It showed-lg T dependence in low x samples, which gradually showed metallic as x increased. Transmission electron microscopy and vibrating sample magnetometer were used to study the microstructures and magnetic properties, the dependence of transport properties on microstructure was also discussed.

     

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