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中国物理学会期刊

MnBiAl薄膜的磁光及磁性能研究

CSTR: 32037.14.aps.48.298

Magneto-Optical and Magnetic Properties of MnBiAl Thin Films

CSTR: 32037.14.aps.48.298
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  • 用真空电子束蒸发制备了MnBixAl0.15薄膜.当0.4≤x≤0.7时,MnBixAl0.15薄膜的Kerr角与MnBix薄膜相比有显著增大;而当x>0.7时,MnBixAl0.15的Kerr角则比MnBix的要不,633nm波长测量时,MnBi0.5Al0.15的Kerr角为2.75°,而相对应的MnBi0.5薄膜只有1.56°.MnBi05Al0.15薄膜的室温饱和磁化强度Ms为3×105A/m,比MnBi0.5薄膜的Ms(4×105A/m)要小.推测当0.4≤x≤0.7时,Al可能部分占据Bi空位和部分取代Mn位,由于晶格收缩使得Mn 3d电子与Bi 6p电子的杂化概率增大,从而导致其Kerr效应增强.

     

    The Kerr rotation of MnBixAl0.15(0.4≤x≤0.9) thin films with and Al protective layer as a function of the Bi concentration, x, has been investigated. Compared with MnBix thin films, it is found that a large enhancement of Kerr rotation appears in the MnBixAl0.15 thin films with 0.4≤x≤0.7, but no enhancement of Kerr rotation appears when x is greater than 0.7. When x=0.5, a maximum Kerr rotation of 2.75° is observed at 633nm for the MnBi0.5Al0.15 thin film, which is much larger than that of 1.56° for the MnBi0.5 thin film. For the MnBixAl0.15 thin films with 0.4≤x≤0.7, the c lattice shrinking may result in a stronger hybridization between Bi 6p and Mn 3d states, which also should be responsible for the large enhancement of Kerr rotatio. In addition, the saturation magnetization Ms is reduced from 4×105A/m for the MnBi0.5 thin film to 3×105A/m for the MnBi0.5Al0.15 thin film, suggesting that some of Al may also substitute for Mn at the octahedrtal sites.

     

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