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中国物理学会期刊

La0.5Sr0.5CoO3薄膜的外延生长及其机理研究

CSTR: 32037.14.aps.48.114

EPITAXIAL GROWTH OF La0.5Sr0.5CoO3 THIN FILMS AND ITS MECHANISMS

CSTR: 32037.14.aps.48.114
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  • 利用脉冲激光制膜法,在多种衬底和温度条件下,系统研究了La0.5Sr0.5CoO3(LSCO)薄膜的结构和外延生长特性,在LaAlO3,SrTiO3和MgO衬底上实现了LSCO薄膜的外延生长.外延生长的薄膜具有低的电阻率和金属性导电特征.研究表明,外延生长的最佳温度范围为700—800℃,最佳衬底为LaAlO3.并着重探讨了衬底材料和淀积温度等多种因素对LSCO薄膜的生长与性

     

    The structures and the epitaxial growth behavior of the La0.5Sr0.5CoO3 thin films prepared by pulsed laser deposition on various substrates and at different deposition temperatures have been studied systematically.Epitaxial growth of the LSCO thin films with low resistivity and metallic conducting features has been demonstrated on the substrates of LaAlO3,SrTiO3 and MgO.Studies reveal that for the epitaxial growth of LSCO thin films,700—800℃ are the optimal deposition temperatures and LaAlO3 is the optimal substrate.Emphases are laid on the discussions of the influences and the mechanisms of substrates and deposition temperatures on the epitaxial growth of the LSCO thin films.

     

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