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中国物理学会期刊

能谷间相互作用对量子阱Ge0.3Si0.7/Si/Ge0.3Si0.7的电子能带结构的影响

CSTR: 32037.14.aps.46.775

THE EFFECTS OF INTERVALLEY INTERACTIONS ON THE ELECTRONIC STRUCTURES IN QUANTUM WELLS Ge0.3Si0.7/Si/Ge0.3Si0.7 GROWN ON Ge0.3Si0.7(001)

CSTR: 32037.14.aps.46.775
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  • 采用建立在经验赝势理论基础上的推广k·p方法及电流密度算符技术,计算了生长在Ge0.3Si0.7(001)衬底上的量子阱Ge0.3Si0.7/Si/Ge0.3Si0.7的导带电子束缚能级.详细地研究了因能谷间相互作用而引起的能级分裂情况,同时也讨论了电子束缚能级在阱平面方向上的色散关系

     

    Using the generalized k·p method based on empirical pseudopotential theory associated with boundary conditions of current density operator,the electronic bound levels are calculated for quantum wells Ge0.3Si0.7/Si/Ge0.3Si0.7 grown on Ge0.3Si0.7(001).The energy level splitting by intervalley interactions is studied in detail and the dispersions of electronic bound levels in the well plane are also discussed.

     

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