The nanimeter-size crystalline Ti films have been manufactured by use of a sputtering deposition utilizing Electron Cyclotron Resonance (ECR) plasma at room temperature. The substrates are quartz glass, NaCl monocrystal and pure Al. The structure and the composition of the Ti films have been determined by using XRD, TEM, XPS. The results show that the granular Ti films consist of nanocrystal particles with the uniformi grain size, the average grain size d<10nm, and with a stable abnormal fcc structure. The influence of working parameters on the crystal structure, the grain size, deposition rate and adhension of the films have been studied systematically. The mechanism of depositing Ti films have been discussed.