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The determination of the optical constants of absorbing films, particularly on opaque substrates, is a difficult problem when solely using spectroscopic ellipsometry. First, unwanted backside reflections are incoherent with the desired reflection from the front side, which makes the fitting of optical constants difficult. Second, the optical constants of substrate must be carefully characterized in advance, as any small absorption in the substrate would be mixed into the film’s overall optical constants. Third, thickness and optical constants are strongly correlated with each other, which may prevent a unique solution for absorbing films. For the above reasons, quartz, glass slide, cover glass and float glass substrates are studied. Backside reflections of the substrates are suppressed by index matching technique. The results show that the simple technique works well for substrate materials with refractive index in a range from 1.43 to 1.64, including materials such as fused silica, float glass, etc. in a spectral range from 190 nm to 1700 nm. The refractive index and extinction coefficient of the substrate are fitted by ellipsometricψdata and the normal spectral transmittance T0. The results are consistent with the literature reported. Finally, a Combined ellipsometry and transmission approach is used to determine the thickness values and optical constants of the diamond-like carbon (DLC) film coated on the quartz and the amorphous silicon (a-Si) film coated on the glass slide and cover glass accurately.
[1] Swanepoel R 1983 J. Phys. E:Sci. Instrum. 16 1214
[2] Swanepoel R 1984 J. Phys. E:Sci. Instrum. 17 896
[3] Hilfiker J N, Singh N, Tiwald T, Convey D, Smith S M, Baker J H, Tompkins H G 2008 Thin Solid Films 516 7979
[4] McGahan W A, Johs B, Woollam J A 1993 Thin Solid Films 234 443
[5] Jellison Jr G E, Merkulov V I, Puretzky A A, Geohegan D B, Eres G, Lowndes D H, Caughman J B 2000 Thin Solid Films 377 68
[6] Jellison Jr G E, Modine F A 1996 Appl. Phys. Lett. 69 371
[7] He J, Li W, Xu R, Guo A R, Qi Q C, Jiang Y D 2008 Acta. Phys. Sin. 57 7114 (in Chinese) [何剑, 李伟, 徐睿, 郭安然, 祁康成, 蒋亚东 2008 57 7114]
[8] Ma J M, Liang Y, Gao X Y, Chen C, Zhao M K, Lu J X 2012 Acta. Phys. Sin. 61 056106 (in Chinese) [马姣民, 梁艳, 郜小勇, 陈超, 赵孟珂, 卢景霄 2012 61 056106]
[9] Franta D, Ohlídal I, Buršíková V, Zajíčková L 2004 Thin Solid Films 455 393
[10] Tompkins H G, Tasic S 2000 J. Vac. Sci. Technol. A 18 946
[11] Zhou Y, Wu G S, Dai W, Li H B, Wang A Y 2010 Acta Phys. Sin. 59 2356 (in Chinese) [周毅, 吴国松, 代伟, 李洪波, 汪爱英 2010 59 2356]
[12] Synowicki R A, Johs B D, Martin A C 2011 Thin Solid Films 519 2907
[13] Fujiwara H 2007 Spectroscopic ellipsometry:principles and applications (Chichester:John Wiley & Sons) p138
[14] Forcht K, Gombert A, Joerger R, Köhl M 1997 Thin Solid Films 302 43
[15] Hayton D J, Jenkins T E 2004 Meas. Sci. Technol. 15 N17
[16] Synowicki R A 2008 Phys. Status Solidi C 5 1085
[17] Kitamura R, Pilon L, Jonasz M 2007 Appl. Optics 46 8118
[18] Bruggeman D A G 1935 Ann. Phys.-Berlin 24 636
[19] Fujiwara H, Koh J, Rovira P I, Collins R W 2000 Phys. Rev. B 61 10832
[20] Colombin L, Jelli A, Riga J, Pireaux J J, Verbist J 1977 J. Non-Cryst. Solids 24 253
[21] Dugnoille B, Virlet O 1994 Appl. Optics 33 5853
[22] Zhao J M, Yang P 2012 Microsystem Technologies 18 1455
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[1] Swanepoel R 1983 J. Phys. E:Sci. Instrum. 16 1214
[2] Swanepoel R 1984 J. Phys. E:Sci. Instrum. 17 896
[3] Hilfiker J N, Singh N, Tiwald T, Convey D, Smith S M, Baker J H, Tompkins H G 2008 Thin Solid Films 516 7979
[4] McGahan W A, Johs B, Woollam J A 1993 Thin Solid Films 234 443
[5] Jellison Jr G E, Merkulov V I, Puretzky A A, Geohegan D B, Eres G, Lowndes D H, Caughman J B 2000 Thin Solid Films 377 68
[6] Jellison Jr G E, Modine F A 1996 Appl. Phys. Lett. 69 371
[7] He J, Li W, Xu R, Guo A R, Qi Q C, Jiang Y D 2008 Acta. Phys. Sin. 57 7114 (in Chinese) [何剑, 李伟, 徐睿, 郭安然, 祁康成, 蒋亚东 2008 57 7114]
[8] Ma J M, Liang Y, Gao X Y, Chen C, Zhao M K, Lu J X 2012 Acta. Phys. Sin. 61 056106 (in Chinese) [马姣民, 梁艳, 郜小勇, 陈超, 赵孟珂, 卢景霄 2012 61 056106]
[9] Franta D, Ohlídal I, Buršíková V, Zajíčková L 2004 Thin Solid Films 455 393
[10] Tompkins H G, Tasic S 2000 J. Vac. Sci. Technol. A 18 946
[11] Zhou Y, Wu G S, Dai W, Li H B, Wang A Y 2010 Acta Phys. Sin. 59 2356 (in Chinese) [周毅, 吴国松, 代伟, 李洪波, 汪爱英 2010 59 2356]
[12] Synowicki R A, Johs B D, Martin A C 2011 Thin Solid Films 519 2907
[13] Fujiwara H 2007 Spectroscopic ellipsometry:principles and applications (Chichester:John Wiley & Sons) p138
[14] Forcht K, Gombert A, Joerger R, Köhl M 1997 Thin Solid Films 302 43
[15] Hayton D J, Jenkins T E 2004 Meas. Sci. Technol. 15 N17
[16] Synowicki R A 2008 Phys. Status Solidi C 5 1085
[17] Kitamura R, Pilon L, Jonasz M 2007 Appl. Optics 46 8118
[18] Bruggeman D A G 1935 Ann. Phys.-Berlin 24 636
[19] Fujiwara H, Koh J, Rovira P I, Collins R W 2000 Phys. Rev. B 61 10832
[20] Colombin L, Jelli A, Riga J, Pireaux J J, Verbist J 1977 J. Non-Cryst. Solids 24 253
[21] Dugnoille B, Virlet O 1994 Appl. Optics 33 5853
[22] Zhao J M, Yang P 2012 Microsystem Technologies 18 1455
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