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Influence of the strong beam impedance on injection and bunching features of the relativistic klystron amplifier

Zhang Ze-Hai Shu Ting Zhang Jun Qi Zu-Min

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Influence of the strong beam impedance on injection and bunching features of the relativistic klystron amplifier

Zhang Ze-Hai, Shu Ting, Zhang Jun, Qi Zu-Min
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  • With numerical calculation and particle simulation program, the influences of the intense electron beam impedance, voltage and current characteristics on the beam modulation and bunching characteristics in relativistic klystron amplifier (RKA) are analyzed. Within the particle-in-cell simulation program, the beam emission method is used to accurately control the impedance of the electron beam. The results show that the electron beam of low-impedance can reduce the bunching distance and shorten the overall length of the RKA devices but degrade the injected modulation of the electron beam. Electron beam of high impedance is just opposite. When the electron beam impedance is constant, the increase of the electron beam accelerating voltage is similar to the increase of the impedance of the electron beam. In addition, with the particle simulation method, the beam loaded conductance of a specific input cavity loaded by a different impedance of the electron beam is determined, thereby meeting the demand of the power level of the seed, and the requirements for the externally loaded quality factor of the input cavity.
    [1]

    Ding Y G 2010 Design, Manufacture and Application of High Power Klystron (Beijing: National Defense Industry Press) pp8-17 (in Chinese) [丁耀根 2010 大功率速调管的设计制造和应用(北京: 国防工业出版社) 第8–17页]

    [2]

    Huang H, Fan Z K, Tan J, Ma Q S, Gan Y Q, Chang A B 2004 Acta Phys. Sin. 53 1129 (in Chinese) [黄华, 范植开, 谭杰, 马乔生, 甘延青, 常安碧 2004 53 1129]

    [3]

    Huang H, Meng F B, Fan Z K, Li Z H 2006 Acta Phys. Sin. 55 5344 (in Chinese) [黄华, 孟凡宝, 范植开, 李正红2006 55 5344]

    [4]

    Bai X C, Yang J H, Zhang J D 2012 Phys. Plasma 19 083106

    [5]

    Liu J, Shu T, Li Z Q 2010 Acta Phys. Sin. 59 2622 ( in Chinese) [刘静, 舒挺, 李志强 2010 59 2622]

    [6]

    Liu J, Shu T, Li Z Q 2010 High Power Laser and Particle Beams 22 1 (in Chinese) [刘静, 舒挺, 李志强 2010 强激光与粒子束 22 1]

    [7]

    Benford J, Swegle J A, Schamiloglu E (translated by Jiang W H, Zhang C) 2009 High Power Microwaves (2nd Ed.) (Beijing: National Defense Industry Press) p315 (in Chinese) [Benford J, Swegle J A, Schamiloglu E著 (江伟华, 张驰译) 2009高功率微波(第二版) (北京:国防工业出版社) 第315页]

    [8]

    Wu Y, Xu Z, Xu Y, Jin X, Chang A B, Li Z H, Huang H, Liu Z, Luo X, Ma Q S, Tang C X 2011 Acta Phys. Sin. 60 044102 (in Chinese) [吴洋, 许州, 徐勇, 金晓, 常安碧, 李正红, 黄华, 刘忠, 罗雄, 马乔生, 唐传祥 2011 60 044102]

    [9]

    Miller R B (translated by Liu X S, Zhang L Z, Wu Y B, Lu J P, Zhou P Z) 1990 Introduction to the Physics of Intense Charged Particle Beam (Beijing: Atom Energy Press) p92 (in Chinese) [米勒R B著 (刘锡山, 张兰芝, 吴衍斌, 鲁敬平, 周丕璋译) 1990 强流带电粒子束物理学导论 (北京: 原子能出版社) 第92页]

    [10]

    Friedman M, Krall J, Lau Y Y, Serlin V 1988 J. Appl. Phys. 64 7

    [11]

    Briggs R J 1976 Phys. Fluids 19 1257

    [12]

    Lau Y Y 1987 J. Appl. Phys. 62 351

    [13]

    Qi Z M, Zhang J, Zhong H H, Zhang Z H, Bai X C, Zhang D, Bai Z 2012 IEEE Trans. Plasma Sci. 40 41

    [14]

    Xie J L, Zhao Y X 1966 Bunching Theory of Klystron (Beijing: Science Press) p77 (in Chinese) [ 谢家麟, 赵永翔 1966 速调管群聚理论 (北京:科学出版社) 第77页]

    [15]

    Zhang Z T 1982 Measurement of High Frequency System in Microwave Tubes (1st Ed.) (Beijing: National Defense Industry Press) p18 (in Chinese) [张兆镗 1982 微波管高频系统的测量 (第一版) (北京: 国防工业出版社) 第18页]

    [16]

    Ding Y G 2008 Theory and Computer Simulation of High Power Klystron (Beijing: National Defense Industry Press) p75 (in Chinese) [丁耀根 2008 大功率速调管的理论与计算模拟(北京:国防工业出版社)第75页]

    [17]

    Carlsten B E, Faehl R J, Fazio M V, Haynes W B, Ryne R D, Stringfield R M 1994 IEEE Trans. Plasma Sci. 22 730

    [18]

    Liu Z B, Huang H, Jin X, Chen H B 2012 Acta Phys. Sin. 60 128402 (in Chinese) [刘振帮, 黄华, 金晓, 陈怀壁 2012 60 128402]

  • [1]

    Ding Y G 2010 Design, Manufacture and Application of High Power Klystron (Beijing: National Defense Industry Press) pp8-17 (in Chinese) [丁耀根 2010 大功率速调管的设计制造和应用(北京: 国防工业出版社) 第8–17页]

    [2]

    Huang H, Fan Z K, Tan J, Ma Q S, Gan Y Q, Chang A B 2004 Acta Phys. Sin. 53 1129 (in Chinese) [黄华, 范植开, 谭杰, 马乔生, 甘延青, 常安碧 2004 53 1129]

    [3]

    Huang H, Meng F B, Fan Z K, Li Z H 2006 Acta Phys. Sin. 55 5344 (in Chinese) [黄华, 孟凡宝, 范植开, 李正红2006 55 5344]

    [4]

    Bai X C, Yang J H, Zhang J D 2012 Phys. Plasma 19 083106

    [5]

    Liu J, Shu T, Li Z Q 2010 Acta Phys. Sin. 59 2622 ( in Chinese) [刘静, 舒挺, 李志强 2010 59 2622]

    [6]

    Liu J, Shu T, Li Z Q 2010 High Power Laser and Particle Beams 22 1 (in Chinese) [刘静, 舒挺, 李志强 2010 强激光与粒子束 22 1]

    [7]

    Benford J, Swegle J A, Schamiloglu E (translated by Jiang W H, Zhang C) 2009 High Power Microwaves (2nd Ed.) (Beijing: National Defense Industry Press) p315 (in Chinese) [Benford J, Swegle J A, Schamiloglu E著 (江伟华, 张驰译) 2009高功率微波(第二版) (北京:国防工业出版社) 第315页]

    [8]

    Wu Y, Xu Z, Xu Y, Jin X, Chang A B, Li Z H, Huang H, Liu Z, Luo X, Ma Q S, Tang C X 2011 Acta Phys. Sin. 60 044102 (in Chinese) [吴洋, 许州, 徐勇, 金晓, 常安碧, 李正红, 黄华, 刘忠, 罗雄, 马乔生, 唐传祥 2011 60 044102]

    [9]

    Miller R B (translated by Liu X S, Zhang L Z, Wu Y B, Lu J P, Zhou P Z) 1990 Introduction to the Physics of Intense Charged Particle Beam (Beijing: Atom Energy Press) p92 (in Chinese) [米勒R B著 (刘锡山, 张兰芝, 吴衍斌, 鲁敬平, 周丕璋译) 1990 强流带电粒子束物理学导论 (北京: 原子能出版社) 第92页]

    [10]

    Friedman M, Krall J, Lau Y Y, Serlin V 1988 J. Appl. Phys. 64 7

    [11]

    Briggs R J 1976 Phys. Fluids 19 1257

    [12]

    Lau Y Y 1987 J. Appl. Phys. 62 351

    [13]

    Qi Z M, Zhang J, Zhong H H, Zhang Z H, Bai X C, Zhang D, Bai Z 2012 IEEE Trans. Plasma Sci. 40 41

    [14]

    Xie J L, Zhao Y X 1966 Bunching Theory of Klystron (Beijing: Science Press) p77 (in Chinese) [ 谢家麟, 赵永翔 1966 速调管群聚理论 (北京:科学出版社) 第77页]

    [15]

    Zhang Z T 1982 Measurement of High Frequency System in Microwave Tubes (1st Ed.) (Beijing: National Defense Industry Press) p18 (in Chinese) [张兆镗 1982 微波管高频系统的测量 (第一版) (北京: 国防工业出版社) 第18页]

    [16]

    Ding Y G 2008 Theory and Computer Simulation of High Power Klystron (Beijing: National Defense Industry Press) p75 (in Chinese) [丁耀根 2008 大功率速调管的理论与计算模拟(北京:国防工业出版社)第75页]

    [17]

    Carlsten B E, Faehl R J, Fazio M V, Haynes W B, Ryne R D, Stringfield R M 1994 IEEE Trans. Plasma Sci. 22 730

    [18]

    Liu Z B, Huang H, Jin X, Chen H B 2012 Acta Phys. Sin. 60 128402 (in Chinese) [刘振帮, 黄华, 金晓, 陈怀壁 2012 60 128402]

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Publishing process
  • Received Date:  23 August 2012
  • Accepted Date:  17 September 2012
  • Published Online:  05 February 2013

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