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Extended interaction klystron amplifier is a very important high power millimeter wave source with many actual and potential applications. Based on the electromagnetic simulation software and 3D PIC code, a W-band extended interaction klystron amplifier is designed. In the PIC simulation, when the beam voltage is 30 kV and current is 8 A, the device can generate a 43 kW output power at 96.8 GHz with an efficiency of 18% and a gain of 49.3 dB.
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Keywords:
- W-band /
- extended interaction klystron /
- PIC simulation /
- beam-wave interaction
[1] Roitman A, Berry D, Steer B 2005 IEEE Transactions on Electron devices 52 895
[2] Feng J J, Hu Y F, Cai J, Wu X P, Tang Y 2010 Vacuum Electronics 2 27 (in Chinese) [冯进军, 胡银富, 蔡军, 邬显平, 唐烨 2010 真空电子技术 2 27]
[3] Cai J, Feng J J, Liao F J, Huang M G, Wu X P 2006 Acta Electronica Sinica 34 2342 (in Chinese) [蔡军, 冯进军, 廖复疆, 黄明光, 邬显平 2006 电子学报 34 2342]
[4] Lai G J, Liu P K 2007 Acta Phys. Sin. 56 4515 (in Chinese) [来国军, 刘濮鲲 2007 56 4515]
[5] Scheitrum G 2005 7^th Workshop on High Energy Density and High Power RF
[6] Ruan C J, Wang S Z, Zhao D, Ruan W, Wang Y, Xie J X 2010 Vacuum Electronics 2 8 (in Chinese) [阮存军, 王树忠, 赵鼎, 阮望, 王勇, 谢敬新 2010 真空电子技术 2 8]
[7] Zhong Y, Ding H B, Wang S Z, Ruan C J, Liang Y, Liu W X 2011 High Power Laser and Particle Beams 23 3055 (in Chinese) [钟勇, 丁海兵, 王树忠, 阮存军, 梁源, 刘文鑫 2011强激光与粒子束 23 3055]
[8] Day W R 1966 Proc of IEEE 54 539
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[1] Roitman A, Berry D, Steer B 2005 IEEE Transactions on Electron devices 52 895
[2] Feng J J, Hu Y F, Cai J, Wu X P, Tang Y 2010 Vacuum Electronics 2 27 (in Chinese) [冯进军, 胡银富, 蔡军, 邬显平, 唐烨 2010 真空电子技术 2 27]
[3] Cai J, Feng J J, Liao F J, Huang M G, Wu X P 2006 Acta Electronica Sinica 34 2342 (in Chinese) [蔡军, 冯进军, 廖复疆, 黄明光, 邬显平 2006 电子学报 34 2342]
[4] Lai G J, Liu P K 2007 Acta Phys. Sin. 56 4515 (in Chinese) [来国军, 刘濮鲲 2007 56 4515]
[5] Scheitrum G 2005 7^th Workshop on High Energy Density and High Power RF
[6] Ruan C J, Wang S Z, Zhao D, Ruan W, Wang Y, Xie J X 2010 Vacuum Electronics 2 8 (in Chinese) [阮存军, 王树忠, 赵鼎, 阮望, 王勇, 谢敬新 2010 真空电子技术 2 8]
[7] Zhong Y, Ding H B, Wang S Z, Ruan C J, Liang Y, Liu W X 2011 High Power Laser and Particle Beams 23 3055 (in Chinese) [钟勇, 丁海兵, 王树忠, 阮存军, 梁源, 刘文鑫 2011强激光与粒子束 23 3055]
[8] Day W R 1966 Proc of IEEE 54 539
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