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Performance of producing a high energy electron can be improved, if the glow discharge is generated in a system of dielectric barrier discharge. In this paper, different discharge modes of pin-to-plane dielectric barrier discharge are investigated in atmospheric pressure. Different discharge modes are observed in the positive half-period and negative half-period of the discharge. When and applied voltage is 3 kV, a streamer mode appear in the positive half-period and a corona (or Trichel discharge) mode occurs in negative half-period. When the applied voltage is 6 kV, a streamer emerges in the positive half-period and a micro glow discharge is present in the negative half-period. The micro glow discharge has hierarchical structure like that typical low pressure glow discharge produces. The generation of micro glow discharge is due to, enough strong cathode electric field strength and effective secondary electron emission process around naked negative electrode. The glow discharge transforming to arc discharge is avoided due to dielectric layer.
[1] Tendero C, Tixier C, Tristant P, Desmaison J, Leprince P 2006 Spectrochimica Acta Part B Atomic Spectroscopy 61 2
[2] Roth J R, Rahel J, Dai X 2005 J. Phys. D: Appl. Phys. 38 555
[3] Fang Z, Qiu Y, Luo Y 2003 J. Phys. D: Appl. Phys. 36 2980
[4] Eden J G 2006 Proc. IEEE 94 567
[5] Kogelschatz U 2002 IEEE Trans. Plasma Sci. 30 1400
[6] Kanazawa S, Kogoma M, Moriwaki T, Okazaki S 1988 J. Phys. D: Appl. Phys. 21 838
[7] Kogoma M, Okazaki S 1994 J. Phys.D:Appl. Phys. 27 1985
[8] Luo H Y, Liang Z, Lv B, Wang X X, Guan Z C, Wang L M 2007 Appl. Phys. Lett. 91 231504
[9] Massines F, Rabehi A, Decomps P, Gadri R B, Ségur P, Mayoux C 1998 J. Appl. Phys. 83 2950
[10] Trunec D, Brablec A, Buchta J 2001 J. Phys. D: Appl. Phys. 34 1697
[11] Radu I, Bartnikas R, Czeremuszkin G, Wertheimer M R 2003 IEEE Trans. Plasma Sci. 31 411
[12] Golubovskii Y B, Maiorov V A, Behnke J F, Tepper J, Lindmayer M 2004 J. Phys. D: Appl. Phys. 37 1346
[13] Luo H Y, Liang Z, Wang X X, Guan Z C, Wang L M 2010 J. Phys. D: Appl. Phys. 43 155201
[14] Okazaki S, Kogoma M, Uehara M, Kimura Y 1993 J. Phys. D: Appl. Phys. 26 889
[15] Qi B, Ren C S, Wang D Z, Li S Z, Wang K, Zhang Y T 2006 Appl. Phys. Lett. 89 131503
[16] Wang X X, Luo H Y, Liang Z, Mao T, Ma R L 2006 Plasma Sources Sci. Technol. 15 845
[17] Radu I, Bartnikas R, Wertheimer M R 2003 J. Phys. D: Appl. Phys. 36 1284
[18] Akishev Y S, Dem'yanov A V, Monich, A E, Trushkin N I 2003 Plasma Physics Reports 29 82
[19] Trichel G W 1938 Phys. Rev. 54 1078
[20] Wagner H E, Brandenburg R, Kozlov K V, Sonnenfeld A, Michel P, Behnke J F 2003 Vacuum 71 417
[21] Takaki K 2004 IEEE Trans. Plasma Sci. 32 2279
[22] Bartnikas R, Radu I, Wertheimer M R 2007 IEEE Trans. Plasma Sci. 35 1437
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[1] Tendero C, Tixier C, Tristant P, Desmaison J, Leprince P 2006 Spectrochimica Acta Part B Atomic Spectroscopy 61 2
[2] Roth J R, Rahel J, Dai X 2005 J. Phys. D: Appl. Phys. 38 555
[3] Fang Z, Qiu Y, Luo Y 2003 J. Phys. D: Appl. Phys. 36 2980
[4] Eden J G 2006 Proc. IEEE 94 567
[5] Kogelschatz U 2002 IEEE Trans. Plasma Sci. 30 1400
[6] Kanazawa S, Kogoma M, Moriwaki T, Okazaki S 1988 J. Phys. D: Appl. Phys. 21 838
[7] Kogoma M, Okazaki S 1994 J. Phys.D:Appl. Phys. 27 1985
[8] Luo H Y, Liang Z, Lv B, Wang X X, Guan Z C, Wang L M 2007 Appl. Phys. Lett. 91 231504
[9] Massines F, Rabehi A, Decomps P, Gadri R B, Ségur P, Mayoux C 1998 J. Appl. Phys. 83 2950
[10] Trunec D, Brablec A, Buchta J 2001 J. Phys. D: Appl. Phys. 34 1697
[11] Radu I, Bartnikas R, Czeremuszkin G, Wertheimer M R 2003 IEEE Trans. Plasma Sci. 31 411
[12] Golubovskii Y B, Maiorov V A, Behnke J F, Tepper J, Lindmayer M 2004 J. Phys. D: Appl. Phys. 37 1346
[13] Luo H Y, Liang Z, Wang X X, Guan Z C, Wang L M 2010 J. Phys. D: Appl. Phys. 43 155201
[14] Okazaki S, Kogoma M, Uehara M, Kimura Y 1993 J. Phys. D: Appl. Phys. 26 889
[15] Qi B, Ren C S, Wang D Z, Li S Z, Wang K, Zhang Y T 2006 Appl. Phys. Lett. 89 131503
[16] Wang X X, Luo H Y, Liang Z, Mao T, Ma R L 2006 Plasma Sources Sci. Technol. 15 845
[17] Radu I, Bartnikas R, Wertheimer M R 2003 J. Phys. D: Appl. Phys. 36 1284
[18] Akishev Y S, Dem'yanov A V, Monich, A E, Trushkin N I 2003 Plasma Physics Reports 29 82
[19] Trichel G W 1938 Phys. Rev. 54 1078
[20] Wagner H E, Brandenburg R, Kozlov K V, Sonnenfeld A, Michel P, Behnke J F 2003 Vacuum 71 417
[21] Takaki K 2004 IEEE Trans. Plasma Sci. 32 2279
[22] Bartnikas R, Radu I, Wertheimer M R 2007 IEEE Trans. Plasma Sci. 35 1437
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