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The Bohm criterion for an electronegative magnetized plasma sheath is investigated with a fluid model. It is shown that the existence of negative ions has an effect on the Bohm criterion. And the numerical value of the ion Mach number depends on the magnetic field and the incidence status of the ions.
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Keywords:
- plasma /
- magnetized sheath /
- Bohm criterion /
- electronegative
[1] Amemiya H 1990 J. Phys. D: Appl. Phys. 23 999
[2] Cooney J L, Aossey DW,Williams J E, Gavin M T, Kim H S, HsuY C, Scheller A, Lonngren K E 1993 Plasma Sources Science andTechnology 2 273
[3] Riemann K U 1991 J. Phys. D: Appl. Phys. 24 493
[4] Riemann K U 1991 Phys. Fluids B 3 3331
[5] Riemann K U 1994 Phys. Plasmas 1 552
[6] Valentini H B 1996 Phys. Plasmas 3 1459
[7] Valentini H B 1996 J. Phys. D: Appl. Phys. 29 1175
[8] Riemann K U, Meyer P 1996 Phys. Plasmas 3 4751
[9] Riemann K U 1997 Phys. Plasmas 4 4158
[10] Chen X P 1998 Phys. Plasmas 5 804
[11] Franklin N R, Snell J 2000 Phys. Plasmas 7 3077
[12] Liu J Y, Wang Z X, Wang X G 2003 Phys. Plasmas 10 3032
[13] Liu J Y,Wang Z X,Wang X G, Zhang Q, Zou X 2003 Phys. Plasmas10 3507
[14] Wang Z X, Liu J Y, Zou X, Liu Y,Wang X G 2004 Acta Phys. Sin.53 793 (in Chinese) [王正汹, 刘金远, 邹秀, 刘悦, 王晓钢 2004 53 793]
[15] Femandez Palop J I, Ballesteros J, Colomer V, Hemandez M A,Dengra A 1995 J. Appl. Phys. 77 2937
[16] Femandez Palop J I, Colomer V, Ballesteros J, Hemandez M A,Dengra A 1996 Surface and Coatings Technology 84 341
[17] Amemiya H, Annaratone B M, Allen J E 1998 J. Appl. Phys. 6081
[18] Li M, Michael A V, Steven K D, Michael J B 2000 IEEE Trans.Plasma Sci. 28 248
[19] Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2003 Chin. Phys.Lett. 20 1537
[20] Gong Y, Duan P, Zhang J H, Zou X, Liu J Y, Liu Y 2010 Chin. J.Com. Phys. Computat. Phys. 27 883
[21] Chodura R 1982 Phys. Fluids 25 1628
[22] Riemann K U 1994 Phys. Plasmas 1 552
[23] Stangeby P C 1995 Phys. Plasmas 2 702
[24] Valsaque F, Manfredi G 2001 J. Nucl. Mater. 290–293 763
[25] Szikora B 2001 Vacuum 61 397
[26] Zou X, Ji Y K, Zou B Y 2010 Acta Phys. Sin. 59 1902 (in Chinese) [邹秀, 籍延坤, 邹滨雁 2010 59 1902]
[27] Zhao X Y, Liu J Y, Duan P, Ni Z X 2011 Acta Phys. Sin. 60045205 (in Chinese) [赵晓云, 刘金远, 段萍, 倪致祥 2011 60 045205]
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[1] Amemiya H 1990 J. Phys. D: Appl. Phys. 23 999
[2] Cooney J L, Aossey DW,Williams J E, Gavin M T, Kim H S, HsuY C, Scheller A, Lonngren K E 1993 Plasma Sources Science andTechnology 2 273
[3] Riemann K U 1991 J. Phys. D: Appl. Phys. 24 493
[4] Riemann K U 1991 Phys. Fluids B 3 3331
[5] Riemann K U 1994 Phys. Plasmas 1 552
[6] Valentini H B 1996 Phys. Plasmas 3 1459
[7] Valentini H B 1996 J. Phys. D: Appl. Phys. 29 1175
[8] Riemann K U, Meyer P 1996 Phys. Plasmas 3 4751
[9] Riemann K U 1997 Phys. Plasmas 4 4158
[10] Chen X P 1998 Phys. Plasmas 5 804
[11] Franklin N R, Snell J 2000 Phys. Plasmas 7 3077
[12] Liu J Y, Wang Z X, Wang X G 2003 Phys. Plasmas 10 3032
[13] Liu J Y,Wang Z X,Wang X G, Zhang Q, Zou X 2003 Phys. Plasmas10 3507
[14] Wang Z X, Liu J Y, Zou X, Liu Y,Wang X G 2004 Acta Phys. Sin.53 793 (in Chinese) [王正汹, 刘金远, 邹秀, 刘悦, 王晓钢 2004 53 793]
[15] Femandez Palop J I, Ballesteros J, Colomer V, Hemandez M A,Dengra A 1995 J. Appl. Phys. 77 2937
[16] Femandez Palop J I, Colomer V, Ballesteros J, Hemandez M A,Dengra A 1996 Surface and Coatings Technology 84 341
[17] Amemiya H, Annaratone B M, Allen J E 1998 J. Appl. Phys. 6081
[18] Li M, Michael A V, Steven K D, Michael J B 2000 IEEE Trans.Plasma Sci. 28 248
[19] Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2003 Chin. Phys.Lett. 20 1537
[20] Gong Y, Duan P, Zhang J H, Zou X, Liu J Y, Liu Y 2010 Chin. J.Com. Phys. Computat. Phys. 27 883
[21] Chodura R 1982 Phys. Fluids 25 1628
[22] Riemann K U 1994 Phys. Plasmas 1 552
[23] Stangeby P C 1995 Phys. Plasmas 2 702
[24] Valsaque F, Manfredi G 2001 J. Nucl. Mater. 290–293 763
[25] Szikora B 2001 Vacuum 61 397
[26] Zou X, Ji Y K, Zou B Y 2010 Acta Phys. Sin. 59 1902 (in Chinese) [邹秀, 籍延坤, 邹滨雁 2010 59 1902]
[27] Zhao X Y, Liu J Y, Duan P, Ni Z X 2011 Acta Phys. Sin. 60045205 (in Chinese) [赵晓云, 刘金远, 段萍, 倪致祥 2011 60 045205]
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