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In this paper, a new method is proposed to investigate the transport mechanism of copper thin film oxidation in water vapor using H162O/H182O isotopic labeling. Copper thin films are prepared on glass substrates by vacuum deposition. The structure of copper oxide film is analysed by X-ray diffraction (XRD). The distributions of16O and18O in the oxide film are analysed by secondary ion mass spectroscopy (SIMS). The results demonstrate that the transport mechanism of copper film oxidation is short-circuit diffusion mechanism.
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Keywords:
- isotopic labeling /
- short circuit diffusion /
- copper thin film /
- H182O
[1] Zhang X, Liu M X, Gao Y, Wang C L, Wang Z W, Zhang X 2006 Chin. Phys. 15 2746
[2] Wu G M, Wang J, Tang X F, Gu M, Chen L Y, Shen J 2000 Acta Phys. Sin. 49 1015 (in Chinese) [吴广明、王 珏、汤学 峰、顾 牡、陈玲燕、沈 军 2000 49 1015] 〖3] Nagai N, Hironaka T, Imai T, Harada T, Nishimura M, Mimori R, Ishida H 2001 Appl. Surf. Sci. 171 101
[3] Abdul-Hak A, Ahrens C, Hasse W, Ullmann J 1997 Microelectron. Eng. 37-38 205
[4] Yu Y J, Kim J G, Cho S H, Boo J H 2003 Surf. Coat. Technol. 162 161
[5] Wang X J, Liang C J, Guan K P, Li D H, Nie Y X, Zhu S Q, Huang F, Zhang W W, Cheng Z W 2008 Chin. Phys. B 17 3512
[6] Aastrup T, Wadsak M, Schreiner M, Leygraf C 2000 Corros. Sci. 42 1539
[7] Asami K, Moriya T, Hashimoto K, Masumoto T 2002 Corros. Sci. 44 331
[8] Guenbour A, Kacemi A, Benbachir A 2000 Prog. Org. Coat. 39 151
[9] Steigerwald J M, Murarka S P, Gutmann R J, Duquette D J 1995 Mater. Chem. Phys. 41 217
[10] Blajiev O L, Breugelmans T, Pintelon R, Hubin A 2006 Electrochim. Acta 51 1403
[11] Tan K S, Wharton J A, Wood R J K 2005 Wear 258 629
[12] Zhou G D, Kamkin A N, Liao Q Q 2001 Acta Phys. Chim. Sin. 17 614 (in Chinese)[周国定、Kamkin A N、廖强强 2001 物理化学学报 17 614]
[13] Itoh J, Sasaki T, Seo M, Ishikawa T 1997 Corros. Sci. 39 193
[14] Wadsak M, Aastrup T, Odnevall Wallinder I, Leygraf C, Schreiner M 2002 Corros. Sci. 44 791
[15] Luo Y F, Jiang Y M, Zhong C, Zhang L, Yan X J, Li J 2007 Acta Phys. Sin. 56 6722(in Chinese) [罗宇峰、蒋益明、钟 澄、张 莉、严学俭、李 劲 2007 56 6722]
[16] Xie X J, Zhu Q S, Fan H, Cao S A, Pan L, Gong X J, Peng K R 2005 Corros. Sci. Prot. Technol. 17 429(in Chinese) [谢学军、朱庆胜、樊 华、曹顺安、潘 玲、龚洵洁、彭珂如 2005 腐蚀科学和防护技术 17 429]
[17] Zheng Y X, Zhao H Y, Ye Y Z, Zhong J S, Xia Z Z, Wu G F 2007 Gas Heat 27 35(in Chinese) [郑永新、赵恒谊、叶远璋、钟家淞、夏昭知、伍国福 2007 煤气与热力 27 35]
[18] Chen J H 2000 Power Station Auxil. Equip. 4 33(in Chinese) [陈娟华 2000 电站辅机 4 33]
[19] Gong J, Jiang Y M, Zhong C, Deng B, Liu P, Li J 2009 Acta Phys. Sin. 58 1305(in Chinese) [龚 佳、蒋益明、钟 澄、邓 博、刘 平、李 劲 2009 58 1305]
[20] Wermer H W 1976 Acta Electron. 19 53
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[1] Zhang X, Liu M X, Gao Y, Wang C L, Wang Z W, Zhang X 2006 Chin. Phys. 15 2746
[2] Wu G M, Wang J, Tang X F, Gu M, Chen L Y, Shen J 2000 Acta Phys. Sin. 49 1015 (in Chinese) [吴广明、王 珏、汤学 峰、顾 牡、陈玲燕、沈 军 2000 49 1015] 〖3] Nagai N, Hironaka T, Imai T, Harada T, Nishimura M, Mimori R, Ishida H 2001 Appl. Surf. Sci. 171 101
[3] Abdul-Hak A, Ahrens C, Hasse W, Ullmann J 1997 Microelectron. Eng. 37-38 205
[4] Yu Y J, Kim J G, Cho S H, Boo J H 2003 Surf. Coat. Technol. 162 161
[5] Wang X J, Liang C J, Guan K P, Li D H, Nie Y X, Zhu S Q, Huang F, Zhang W W, Cheng Z W 2008 Chin. Phys. B 17 3512
[6] Aastrup T, Wadsak M, Schreiner M, Leygraf C 2000 Corros. Sci. 42 1539
[7] Asami K, Moriya T, Hashimoto K, Masumoto T 2002 Corros. Sci. 44 331
[8] Guenbour A, Kacemi A, Benbachir A 2000 Prog. Org. Coat. 39 151
[9] Steigerwald J M, Murarka S P, Gutmann R J, Duquette D J 1995 Mater. Chem. Phys. 41 217
[10] Blajiev O L, Breugelmans T, Pintelon R, Hubin A 2006 Electrochim. Acta 51 1403
[11] Tan K S, Wharton J A, Wood R J K 2005 Wear 258 629
[12] Zhou G D, Kamkin A N, Liao Q Q 2001 Acta Phys. Chim. Sin. 17 614 (in Chinese)[周国定、Kamkin A N、廖强强 2001 物理化学学报 17 614]
[13] Itoh J, Sasaki T, Seo M, Ishikawa T 1997 Corros. Sci. 39 193
[14] Wadsak M, Aastrup T, Odnevall Wallinder I, Leygraf C, Schreiner M 2002 Corros. Sci. 44 791
[15] Luo Y F, Jiang Y M, Zhong C, Zhang L, Yan X J, Li J 2007 Acta Phys. Sin. 56 6722(in Chinese) [罗宇峰、蒋益明、钟 澄、张 莉、严学俭、李 劲 2007 56 6722]
[16] Xie X J, Zhu Q S, Fan H, Cao S A, Pan L, Gong X J, Peng K R 2005 Corros. Sci. Prot. Technol. 17 429(in Chinese) [谢学军、朱庆胜、樊 华、曹顺安、潘 玲、龚洵洁、彭珂如 2005 腐蚀科学和防护技术 17 429]
[17] Zheng Y X, Zhao H Y, Ye Y Z, Zhong J S, Xia Z Z, Wu G F 2007 Gas Heat 27 35(in Chinese) [郑永新、赵恒谊、叶远璋、钟家淞、夏昭知、伍国福 2007 煤气与热力 27 35]
[18] Chen J H 2000 Power Station Auxil. Equip. 4 33(in Chinese) [陈娟华 2000 电站辅机 4 33]
[19] Gong J, Jiang Y M, Zhong C, Deng B, Liu P, Li J 2009 Acta Phys. Sin. 58 1305(in Chinese) [龚 佳、蒋益明、钟 澄、邓 博、刘 平、李 劲 2009 58 1305]
[20] Wermer H W 1976 Acta Electron. 19 53
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