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本文利用微波相位法和光谱诊断法, 研究了ICP放电等离子体在圆台状夹层等离子体中E模和H模相互转换的物理现象. E模和H模的之间转换过程是一个瞬间突变的, 转换点的输入功率随真空室压强的变化而变化. H模向E模转换的阈值功率低于E模向H模转换的值, 等离子体参数随输入功率变化曲线类似于铁磁物质中的磁滞回线. Ar II 408.2 nm谱线的强度的变化规律和电子密度随功率变化的规律基本一致. 通过本实验可以获得一种电子密度范围为3.85×1011 cm-3 ne 11 cm-3, 外表面积为0.3 m2, 厚度为2 cm稳定工作的等离子体源.We do some research on E-H mode transition of inductively coupled plasma (ICP) in the interlayer chamber, using the microwave phase and plasma spectrum diagnotic technique. The mode transition between E and H mode is a sudden changes phenomenon. The input power of the transition varies as the pressure changes in the chamber. The transition power from H to E is less than from E to H, so the hysteresis in power hence is established. The change of the relative spectral intensity is basically the same the variation of the electron density with input power. We obtain a stable plasma source, with an electron density ranging from 3.85× 1011 cm-3 to 4.68× 1011 cm-3, an outer surface area of 0.3 m2, and a thickness of 2 cm.
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Keywords:
- ICP discharge /
- E-H Mode /
- plasma source /
- plasma spectrum
[1] Lieberman M A, Lichtenberg A J 蒲以康译2007 等离子体放电原理与材料处理, 第一版 (北京: 科学出版社) 第350—352页
[2] Eugen Statnic, Valentin Tanach 2006 Plasma Sources Sci. Technol. 15 465
[3] Cunge G, Crowley B, Vender D, Turner M M 1999 Plasma Sources Sci. Technol 8 576
[4] Tang X M, Manos D M 2000 J. Vac. Sci. Technol. A 18 1359
[5] Czerwiec T, Graves D B 2004 J. Phys. D:Appl. Phys. 37 2827
[6] Daltrini1 A M, Moshkalev1 S A , Monteiro1 M J R, Besseler1 E, Kostryukov A, Machida M 2007 J. Appl. Phys. 101 073309
[7] Turner M M, Lieberman M A 1999 Plasma Sources Sci. Technol. 8 313
[8] Zhu X M, Pu Y K 2006 Phys. Plasmas. 13 123501
[9] Liu L, Cao J X Niu T Y 2009 Plasma Science and Technology 11 307
[10] www.nist.gov
[11] Hutchinson I H 2002 Principles of Plasma Diagnostics (Cambridge: Cambridge University Press) p116-117
[12] Wang Y, Cao J X, Song F L 2007 Journal of Microwaves 23 29 (in Chinese) [王艳, 曹金祥, 宋法伦 2007 微波学报 23 29]
[13] Amorim J, Maciel H S, Sudano J P 1991 J. Vac. Sci. Technol. B 9 362
[14] Gilles Cunge, Brendan Crowley, David Vender, Turner M M 1999 Plasma Sources Sci. Technol. 8 576
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[1] Lieberman M A, Lichtenberg A J 蒲以康译2007 等离子体放电原理与材料处理, 第一版 (北京: 科学出版社) 第350—352页
[2] Eugen Statnic, Valentin Tanach 2006 Plasma Sources Sci. Technol. 15 465
[3] Cunge G, Crowley B, Vender D, Turner M M 1999 Plasma Sources Sci. Technol 8 576
[4] Tang X M, Manos D M 2000 J. Vac. Sci. Technol. A 18 1359
[5] Czerwiec T, Graves D B 2004 J. Phys. D:Appl. Phys. 37 2827
[6] Daltrini1 A M, Moshkalev1 S A , Monteiro1 M J R, Besseler1 E, Kostryukov A, Machida M 2007 J. Appl. Phys. 101 073309
[7] Turner M M, Lieberman M A 1999 Plasma Sources Sci. Technol. 8 313
[8] Zhu X M, Pu Y K 2006 Phys. Plasmas. 13 123501
[9] Liu L, Cao J X Niu T Y 2009 Plasma Science and Technology 11 307
[10] www.nist.gov
[11] Hutchinson I H 2002 Principles of Plasma Diagnostics (Cambridge: Cambridge University Press) p116-117
[12] Wang Y, Cao J X, Song F L 2007 Journal of Microwaves 23 29 (in Chinese) [王艳, 曹金祥, 宋法伦 2007 微波学报 23 29]
[13] Amorim J, Maciel H S, Sudano J P 1991 J. Vac. Sci. Technol. B 9 362
[14] Gilles Cunge, Brendan Crowley, David Vender, Turner M M 1999 Plasma Sources Sci. Technol. 8 576
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