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In vacuum environment, the nano-crystalline silicon films were prepared by pulsed laser ablation at high temperature and room temperature respectively. The amorphous films prepared under normal temperature were thermal-annealed, which leads to crystallization. The morphology and compositon etc. of the samples were characterized by scanning electron microscopy, Raman scattering and X-ray diffraction. The results showed that the temperature threshold of Si nanoparticles formation was 700 ℃ and 850 ℃ respectively. The nucleation energy of the nanoparticles was obtained by quantitative calculation, and the reason of difference between the temperature threshold was discussed from the point of view of energy.
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Keywords:
- pulsed laser ablation /
- temperature threshold /
- nucleation energy
[1] Osborne I S 2002 Science 296 2299
[2] Qiu S H, Chen C Z, Liu C Q, Wu Y D, Li P, Lin X Y, Yu C Y 2009 Acta Phys. Sin. 58 565 (in Chinese )[邱胜桦、陈城钊、刘翠青、吴燕丹、李 平、林璇英、余楚迎 2009 58 565]
[3] Lee H S, Choi S, Kim S W 2009 Thin Solid Films 517 4070
[4] Her Y C, Wu C L 2004 J. Appl. Phys. 96 5563
[5] Wang Y L, Zhou Y, Chu L Z, Fu G S, Peng Y C 2005 Acta Phys. Sin. 54 1683 (in Chinese) [王英龙、周 阳、褚立志、傅广生、彭英才 2005 54 1683]
[6] Wang Y L, Deng Z C, Fu G S, Zhou Y, Chu L Z, Peng Y C 2006 Thin Solid Films 515 1897
[7] Wang Y L, Li Y L, Fu G S 2006 Nucl. Instrum. Meth. B 252 245
[8] Fu G S, Wang Y L, Chu L Z, Zhou Y, Yu W 2005 Europhys. Lett. 69 758
[9] Chu L Z, Lu L F, Wang Y L, Fu G S 2007 Acta Phys. Sin. 56 3374 (in Chinese) [褚立志、卢丽芳、王英龙、傅广生2007 56 3374]
[10] Ossadnik C, Veprek S, Gregora I 1999 Thin Solid Films 337 148
[11] Wang Y L, Deng Z C, Chu L Z, Fu G S, Peng Y C 2009 Europhys. Lett. 86 15001
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[1] Osborne I S 2002 Science 296 2299
[2] Qiu S H, Chen C Z, Liu C Q, Wu Y D, Li P, Lin X Y, Yu C Y 2009 Acta Phys. Sin. 58 565 (in Chinese )[邱胜桦、陈城钊、刘翠青、吴燕丹、李 平、林璇英、余楚迎 2009 58 565]
[3] Lee H S, Choi S, Kim S W 2009 Thin Solid Films 517 4070
[4] Her Y C, Wu C L 2004 J. Appl. Phys. 96 5563
[5] Wang Y L, Zhou Y, Chu L Z, Fu G S, Peng Y C 2005 Acta Phys. Sin. 54 1683 (in Chinese) [王英龙、周 阳、褚立志、傅广生、彭英才 2005 54 1683]
[6] Wang Y L, Deng Z C, Fu G S, Zhou Y, Chu L Z, Peng Y C 2006 Thin Solid Films 515 1897
[7] Wang Y L, Li Y L, Fu G S 2006 Nucl. Instrum. Meth. B 252 245
[8] Fu G S, Wang Y L, Chu L Z, Zhou Y, Yu W 2005 Europhys. Lett. 69 758
[9] Chu L Z, Lu L F, Wang Y L, Fu G S 2007 Acta Phys. Sin. 56 3374 (in Chinese) [褚立志、卢丽芳、王英龙、傅广生2007 56 3374]
[10] Ossadnik C, Veprek S, Gregora I 1999 Thin Solid Films 337 148
[11] Wang Y L, Deng Z C, Chu L Z, Fu G S, Peng Y C 2009 Europhys. Lett. 86 15001
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