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A new approach for accurate measurement of the absorbing film thickness and optical constants by combined ellipsometry and spectrophotometry is introduced. The details are studied in terms of the mathematical models and formulats in comparison with the commonly used method which is only dependent on the ellipsometry data specifically. Using variable angle spectroscopic ellipsometry (VASE), the diamond-like carbon film deposited by a glow discharge technique was characterized at the wavelength range of 250—1700 nm. The results indicate that, generally, it is rather difficult to determine the thickness and optical constants of absorbing film accurately and rapidly due to the strong correlation between thickness and n, k. By simultaneously fitting ellipsometry parameters and film transmittance, however, the optical constants could be obtained easily and accurately from a unique solution without any predetermined dispersion model. The fitting results of DLC show that this approach is a promising method to determine the thicknesses and optical constants of films, especially of the thin absorbing films.
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Keywords:
- optical constants /
- spectroscopic ellipsometry /
- absorbing films /
- transmittance
[1] ［1］Xu Z J 2007 Detection and Analysis of Semiconductor (Bejing: Science Press) p254 (in Chinese)［许振嘉 2007半导体的检测与分析 (北京: 科学出版社) 第254页］
[2] ［2］Mulato M, Chambouleyron I, Birgin E G, Martinez J M 2000 Appl. Phys. Lett. 77 2133
[3] ［3］Wang C W, Wang J, Li Y, Liu W M, Xu T, Sun X W, Li H L 2005 Acta Phys. Sin. 54 439 (in Chinese)［王成伟、王建、李燕、刘维民、徐洮、孙小伟、力虎林 2005 54 439］
[4] ［4］Gu P F, Chen H X, Zhen Z R, Liu X 2005 Acta Phys. Sin. 54 3722 (in Chinese)［顾培夫、陈海星、郑臻荣、刘 旭 2005 54 3722］
[5] ［5］Tang J F, Gu P F, Li X, Li H F 2006 Modern Optical Thin Film Technology (Hangzhou: Zhejiang University Press) pp407—412 (in Chinese)［唐晋发、顾培夫、李旭、李海峰 2006 现代光学薄膜技术 (杭州: 浙江大学出版社) 第407—412页］
[6] ［6］Chen Y P, Yu F H 2006 Opt. Instru. 28 84 (in Chinese)［陈燕平、余飞鸿 2006 光学仪器 28 84］
[7] ［7］Palik E D 1985 Handbook of Optical Constants of Solids (San Diego: Academic Press) pp89—110
[8] ［8］Tompkins H G, Irene E A 2005 Handbook of Ellipsometry (Norwich: William Andrew Publishing) pp252—253
[9] ［9］Herzinger C M, Yao H, Snyder P G, Celii F G, Kao Y C, Johs B, Woollam J A 1995 J. Appl. Phys. 77 4677
[10] ］Hilfiker J N, Bungay C L, Synowicki R A, Tiwald T E, Herzinger C M, Johs B, Pribil G K, Woollam J A 2003 J. Vac. Sci. Technol. A 21 1103
[11] ］Jarrendahl K, Arwin H 1998 Thin Solid Films 313 114
[12] ］McGahan W A, Johs B, Woollam J A 1993 Thin Solid Films 234 443
[13] ］Fujiwara H 2007 Spectroscopic Ellipsometry: Principles and Applications (Chichester: John Wiley & Sons) pp81—87
[14] ］Macloed H A 2001 Thin-film Optical Filters 3rd Ed. (Bristol: Institute of Physics Publishing) pp27—69
[15] ］Shen H J, Wang L J, Fang Z J, Zhang M L, Yang Y, Wang L, Xia Y B 2004 Acta Phys. Sin. 53 2009 (in Chinese)［沈沪江、王林军、方志军、张明龙、杨莹、汪琳、夏义本 2004 53 2009］
[16] ］Aspnes D E, Theeten J B 1979 Phys. Rev. B 20 3292
[17] ］Tikhonravov A V, Trubetskov M K, Tikhonravov A A, Duparre A 2003 Appl. Opt. 42 5140
[18] ］McMarr P J, Blanco J R 1988 Appl. Opt. 27 4265
[19] ］Bruggeman D A G 1935 Ann. Phys. -Berlin 24 636
[20] ］Fujiwara H, Koh J, Rovira P I, Collins R W 2000 Phys. Rev. B 61 10832
[21] ］Franta D, Zajickova L, Ohlidal I, Janca J, Veltruska K 2002 Diam. Relat. Mater. 11 105
[22] ］Tompkins H G, Tasic S 2000 J. Vac. Sci. Technol. A 18 946
[23] ］Hilfiker J N, Singh N, Tiwald T, Convey D, Smith S M, Baker J H, Tompkins H G 2008 Thin Solid Films 516 7979
[24] ］Liang L P, Hao J Y, Qin M, Zhen J J 2008 Acta Phys. Sin. 57 7906 (in Chinese)［梁丽萍、郝建英、秦梅、郑建军 2008 57 7906］
[25] ］Robertson J 2002 Mat. Sci. Eng. 37 153
[26] ］Tauc J, Grigorov R, Vancu A 1966 Phys. Status Solidi 15 627
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[1] ［1］Xu Z J 2007 Detection and Analysis of Semiconductor (Bejing: Science Press) p254 (in Chinese)［许振嘉 2007半导体的检测与分析 (北京: 科学出版社) 第254页］
[2] ［2］Mulato M, Chambouleyron I, Birgin E G, Martinez J M 2000 Appl. Phys. Lett. 77 2133
[3] ［3］Wang C W, Wang J, Li Y, Liu W M, Xu T, Sun X W, Li H L 2005 Acta Phys. Sin. 54 439 (in Chinese)［王成伟、王建、李燕、刘维民、徐洮、孙小伟、力虎林 2005 54 439］
[4] ［4］Gu P F, Chen H X, Zhen Z R, Liu X 2005 Acta Phys. Sin. 54 3722 (in Chinese)［顾培夫、陈海星、郑臻荣、刘 旭 2005 54 3722］
[5] ［5］Tang J F, Gu P F, Li X, Li H F 2006 Modern Optical Thin Film Technology (Hangzhou: Zhejiang University Press) pp407—412 (in Chinese)［唐晋发、顾培夫、李旭、李海峰 2006 现代光学薄膜技术 (杭州: 浙江大学出版社) 第407—412页］
[6] ［6］Chen Y P, Yu F H 2006 Opt. Instru. 28 84 (in Chinese)［陈燕平、余飞鸿 2006 光学仪器 28 84］
[7] ［7］Palik E D 1985 Handbook of Optical Constants of Solids (San Diego: Academic Press) pp89—110
[8] ［8］Tompkins H G, Irene E A 2005 Handbook of Ellipsometry (Norwich: William Andrew Publishing) pp252—253
[9] ［9］Herzinger C M, Yao H, Snyder P G, Celii F G, Kao Y C, Johs B, Woollam J A 1995 J. Appl. Phys. 77 4677
[10] ］Hilfiker J N, Bungay C L, Synowicki R A, Tiwald T E, Herzinger C M, Johs B, Pribil G K, Woollam J A 2003 J. Vac. Sci. Technol. A 21 1103
[11] ］Jarrendahl K, Arwin H 1998 Thin Solid Films 313 114
[12] ］McGahan W A, Johs B, Woollam J A 1993 Thin Solid Films 234 443
[13] ］Fujiwara H 2007 Spectroscopic Ellipsometry: Principles and Applications (Chichester: John Wiley & Sons) pp81—87
[14] ］Macloed H A 2001 Thin-film Optical Filters 3rd Ed. (Bristol: Institute of Physics Publishing) pp27—69
[15] ］Shen H J, Wang L J, Fang Z J, Zhang M L, Yang Y, Wang L, Xia Y B 2004 Acta Phys. Sin. 53 2009 (in Chinese)［沈沪江、王林军、方志军、张明龙、杨莹、汪琳、夏义本 2004 53 2009］
[16] ］Aspnes D E, Theeten J B 1979 Phys. Rev. B 20 3292
[17] ］Tikhonravov A V, Trubetskov M K, Tikhonravov A A, Duparre A 2003 Appl. Opt. 42 5140
[18] ］McMarr P J, Blanco J R 1988 Appl. Opt. 27 4265
[19] ］Bruggeman D A G 1935 Ann. Phys. -Berlin 24 636
[20] ］Fujiwara H, Koh J, Rovira P I, Collins R W 2000 Phys. Rev. B 61 10832
[21] ］Franta D, Zajickova L, Ohlidal I, Janca J, Veltruska K 2002 Diam. Relat. Mater. 11 105
[22] ］Tompkins H G, Tasic S 2000 J. Vac. Sci. Technol. A 18 946
[23] ］Hilfiker J N, Singh N, Tiwald T, Convey D, Smith S M, Baker J H, Tompkins H G 2008 Thin Solid Films 516 7979
[24] ］Liang L P, Hao J Y, Qin M, Zhen J J 2008 Acta Phys. Sin. 57 7906 (in Chinese)［梁丽萍、郝建英、秦梅、郑建军 2008 57 7906］
[25] ］Robertson J 2002 Mat. Sci. Eng. 37 153
[26] ］Tauc J, Grigorov R, Vancu A 1966 Phys. Status Solidi 15 627
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