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利用紧束缚近似下的格林函数方法,讨论了Si中硫属元素混对杂质(即S0/Se0,S0/Te0和Se0/Te0)基态的电子结构。混对杂质在Si禁带中引入两个A1能级,其中成键性的A1能级位置在反键性的A1能级之上。数值计算得到的混对杂质能级与实验符合得相当好。理论分析表明,在Si中测到的那些未定的比最近邻混对杂质能级更浅的能级(S0/Se0(X1),S0/Te0(X1),Se0/Te0(X1)…)不是由非最近邻位型的混对杂质引入的。本文还指出了一个极性分子放入Si晶体中,两个不同原子间s波函数的转移方向与通常极性分子相反,并讨论其物理原因。Using the Green's function method with a tight binding Hamiltonian, the electronic structures of the ground states of S0/Se0, S0/Te0 and Se0/Te0 mixed pairs in Si are investigated. Two A1 symmetrical states are introduced by the mixed pairs, the bonding A1 state is higher than the antibonding A1 state. The numerical results of the energy leveals of mixed pairs are obtained, which are in agreement with the experimental observations. It looks likely that the unidentified shallower energy leveals (S0/Se0 (X1), S0/Te0 (X1), Se0/Te0 (X1)…) are not introduced by the mixed pairs with other non-nearest positions. We note that the transfer direction of the s wavefuction between two different defect atoms in Si is reversed as compare with the ordinary diatomic molecule case. The physical reason is discussed.
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