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用12kW转靶X射线衍射装置测定了非晶半导体a-As2Se3,a-AsSe以及a-As0.05,Se0.95的k吸收EXAFS,a-As2Se3经T≤Tg(玻璃转变温度)的不同温度处理后,亦进行了测定。由获得的径向结构函数分析表明:尽管a-As2Se3的短程结构与晶态c-As2Se3十分相似,但经过低于Tg的退火处理后,其径向结构函数发生了一定的变化。熔态淬火制备的a-As2Se3块体亦发生结构弛豫。此外,在非晶态As-Se二元系中随As含量的变化,材料的近程结构亦不同。The EXAFS of amorphous semiconductor a-As2Se3, a-AsSe, a-As0.05 Se0.95 and a-As2Se3) after annealing at different temperatures lower than Tg are measured by 12 kW rotating anode X-ray diffraction equipment. Analyses of the determined radial structural functions shows that although the short range structure of a-As2Se3 is very similar to that for crystalline As2Se3, some changes take place in its radial structural function after annealing. The structural relaxation in a-As2Se3, quenched from melt, has also been observed. The short range structures for different components of As in binary As-Se system seem to be different.
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