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碳化硅(SiC)是典型的层状结构化合物。到目前为止,已发现了150种以上的多型体。作者曾发展了一种特殊的劳厄法可有效地鉴定碳化硅多型体。这种方法,我们发现了85种碳化硅新多型体。为了测定其中一些多型体的结构,拍摄了回摆和魏森堡照相作结构分析,但没有成功。因为这些照相中只有一些基本类型6H,15R和8H的衍射斑点而没有高层多型体的斑点,这是由于新多型体在晶体中含量很少且这些薄晶体多型体处于基本类型6H,8H,15R中间的缘故。本文提出了一种测定碳化硅多型体晶体结构的劳厄法。提出了计算劳厄斑点衍射强度的方法。对结构系列[(33)m32]3,[(33)m34]3,[(22)m23]3和[(44)m43]3多型体的结构因子Fhkl的计算方法作了简化。利用这种方法对9种碳化硅新多型体的晶体结构作了测定,其结构用z字形堆垛(Жданов符号)表示时为231R:[(33)1232]3,249R:[(33)1332]3,321R:[(33)1732]3, 339R:[(33)1832]3,237R:[(33)1234]3,417R:[(33)2234]3, 453R:[(33)2434]3,93R:[(44)343]3,261R:[(44)1043]3。Silicon carbide is a typical layer compound. Up to the present more than 150 polytypes of SiC are known. The author has developed a special Laue method which is very efficient in identifying polytypes of SiC. Using this method, we have found eightyfive new polytypes of SiC. In order to determine the crystal structure of some of these new polytypes, oscillation method and Weissenberg method have been tried but without success, because only diffraction spots of the basic polytypes 6H, 15R and 8H can be found in these photographs. This is possibly due to the smallness of these new polytypes in bulk crystals and also to the fact that these tiny polytypes are imbedded in a large 6H or 8H, 15R polytypes. A modified laue method to determine the crystal structure of SiC polytypes is developed, as well as a method for calculating the diffraction intensity of laue spot. The calculation of structure factor Fhkl in [(33)m32]3, [(33)m34]3, [(22)m23]3 and [(44)m43]3 structure families is simplified. Using this method, the crystal structure of nine new polytypes of silicon carbide have been determined. The crystal structure of these new polytypes can be designate by the Z stacking sequences (Жданов notation) as follows, 231R:[(33)1232]3,249R:[(33)1332]3,321R:[(33)1732]3, 339R:[(33)1832]3,237R:[(33)1234]3,417R:[(33)2234]3, 453R:[(33)2434]3,93R:[(44)343]3,261R:[(44)1043]3.
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